Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO_2 films prepared by the electron-beam evaporation method

2004 ◽  
Vol 29 (24) ◽  
pp. 2870 ◽  
Author(s):  
Dongping Zhang ◽  
Jianda Shao ◽  
Dawei Zhang ◽  
Shuhai Fan ◽  
Tianya Tan ◽  
...  
Keyword(s):  
Electron Beam ◽  
Oxygen Plasma ◽  
Damage Threshold ◽  
Electron Beam Evaporation ◽  
Evaporation Method ◽  
Laser Induced Damage

Optical, Structural and Laser-Induced Damage Threshold Properties of HfO 2 Thin Films Prepared by Electron Beam Evaporation

2005 ◽  
Vol 22 (5) ◽  
pp. 1246-1248 ◽  
Author(s):  
Zhan Mei-Qiong ◽  
Zhang Dong-Ping ◽  
Tan Tian-Ya ◽  
He Hong-Bo ◽  
Shao Jian-Da ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Damage Threshold ◽  
Electron Beam Evaporation ◽  
Laser Induced Damage

High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation

2005 ◽  
Vol 243 (1-4) ◽  
pp. 232-237 ◽  
Author(s):  
Dawei Zhang ◽  
Shuhai Fan ◽  
Yuanan Zhao ◽  
Weidong Gao ◽  
Jianda Shao ◽  
...  
Keyword(s):  
Electron Beam ◽  
Damage Threshold ◽  
Electron Beam Evaporation ◽  
High Laser ◽  
Laser Induced Damage

Influence of oxygen-plasma posttreatment on the properties of SiO2 films prepared by the electron-beam evaporation method

Optik ◽  
2010 ◽  
Vol 121 (9) ◽  
pp. 839-842 ◽  
Author(s):  
Y.J. Guo ◽  
X.T. Zu ◽  
X.D. Jiang ◽  
X.D. Yuan ◽  
H.B. Lv
Keyword(s):  
Electron Beam ◽  
Oxygen Plasma ◽  
Electron Beam Evaporation ◽  
Sio2 Films ◽  
Evaporation Method
Sign in / Sign up

Export Citation Format

Share Document