Deposition of Thin Films of Silicon Carbide on Fused Quartz and on Sapphire by Laser Ablation of Ceramic Silicon Carbide Targets

1992 ◽  
Vol 285 ◽  
Author(s):  
L. Rimai ◽  
R. Ager ◽  
J. Hangas ◽  
E. M. Loaothetis ◽  
Nayef Abu-ageel ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Room Temperature ◽  
Optical Band Gap ◽  
Energy Gap ◽  
Fused Silica ◽  
High Resistivity ◽  
Fused Quartz ◽  
Amorphous Sic ◽  
Very High

ABSTRACTAblation of ceramic silicon carbide with 351 nm excimer radiation was used to depositSIC films on fused silica and on sapphire. For deposition temperatures above 850° C, diffraction shows the films to be crystalline with the [111] axis preferentially oriented normally to the film. Optical spectra show an indirect energy gap at 2.2 eV, near that for the cubic polytype, although the 200 diffractions are absent. Room temperature resistivities range between .02 to .1 Ωcm. Deposition below 600° C yields amorphous SiC with no diffraction bands, low and variable optical band gap and very high resistivity.

DC-Magnetron Sputtered Silicon Carbide

1994 ◽  
Vol 356 ◽  
Author(s):  
M. Tenhover ◽  
I. B. Ruppel
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Ceramic Material ◽  
Room Temperature ◽  
Thick Films ◽  
Target Material ◽  
Electrically Conductive ◽  
Dense Ceramic ◽  
Amorphous Sic ◽  
Sic Films

AbstractThe preparation and properties of relatively thick films of DC magnetron sputtered SiC films is described. The films were prepared using a new ceramic sputter target material. The new target material is called Hexoloy® SG–90. It is an electrically conductive, dense ceramic material which can be used as a sputter target to yield insulating amorphous SiC thin films on room temperature substrates.

scholarly journals Optical and Structural Properties of CdS Quantum Dots Synthesized Using (MW-CBD) Technique

2020 ◽  
pp. 44-52
Author(s):  
Ahmed Ahmed S. Abed ◽  
Sattar J. Kasim ◽  
Abbas F. Abbas
Keyword(s):  
Thin Films ◽  
Quantum Dots ◽  
Room Temperature ◽  
Energy Gap ◽  
Cds Nanoparticles ◽  
Cds Quantum Dots ◽  
Optical Energy Gap ◽  
Glass Substrates ◽  
High Adhesion ◽  
Uv Visible

In the present study, the microwave heating method was used to prepare cadmium sulfide quantum dots CdSQDs films. CdS nanoparticles size average obtained as (7nm). The morphology, structure and composition of prepared CdSQDs were examined using (FE-SEM), (XRD) and (EDX). Optical properties of CdSQDs thin films formed and deposited onto glass substrates have been studied at room temperature using UV/ Visible spectrophotometer within the wavelength of (300-800nm), and Photoluminescence (PL) spectrum. The optical energy gap (Eg) which estimated using Tauc relation was equal (2.6eV). Prepared CdS nanoparticles thin films are free from cracks, pinholes and have high adhesion to substrate.

scholarly journals Very high commutation quality factor and dielectric tunability in nanocomposite SrTiO3 thin films with Tc enhanced to >300 °C

Nanoscale ◽  
2018 ◽  
Vol 10 (7) ◽  
pp. 3460-3468 ◽  
Author(s):  
Abhijeet L. Sangle ◽  
Oon Jew Lee ◽  
Ahmed Kursumovic ◽  
Wenrui Zhang ◽  
Aiping Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Quality Factor ◽  
Room Temperature ◽  
Dielectric Tunability ◽  
Nanocomposite Thin Films ◽  
Very High

We report on nanoengineered SrTiO3–Sm2O3 nanocomposite thin films with the highest reported values of commutation quality factor (CQF or K-factor) of >2800 in SrTiO3 at room temperature.

scholarly journals Effects of the Argon Pressure on the Optical Band Gap of Zinc Oxide Thin Films Grown by Nonreactive RF Sputtering

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
M. Acosta ◽  
I. Riech ◽  
E. Martín-Tovar
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Band Gap ◽  
Room Temperature ◽  
Optical Band Gap ◽  
Rf Sputtering ◽  
Argon Pressure ◽  
Band Gaps ◽  
Zno Thin Films ◽  
Optical Band Gaps

Zinc oxide (ZnO) thin films were grown by nonreactive RF sputtering at room temperature under varying argon pressures (PAr). Their optical band gap was found to increase from 3.58 to 4.34 eV when the argon pressure increases from 2.67 to 10.66 Pa. After annealing at 200°C and 500°C, optical band gaps decrease considerably. The observed widening of the band gap with increasingPArcan be understood as being a consequence of the poorer crystallinity of films grown at higher pressures. Measurements of morphological and electrical properties of these films correlate well with this picture. Our main aim is to understand the effects ofPAron several physical properties of the films, and most importantly on its optical band gap.

Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning

2012 ◽  
Vol 717-720 ◽  
pp. 889-892 ◽  
Author(s):  
Hamidreza Zamani ◽  
Seung Wan Lee ◽  
Amir Avishai ◽  
Christian A. Zorman ◽  
R. Mohan Sankaran ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Quality ◽  
Nanoscale Patterning ◽  
Different Types ◽  
Thin Membranes ◽  
Amorphous Sic ◽  
Nanoscale Features

We report on experimental explorations of using focused ion beam (FIB) nanomachining of different types of silicon carbide (SiC) thin membranes, for making robust, high-quality stencil masks for new emerging options of nanoscale patterning. Using thin films and membranes in polycrystalline SiC (poly-SiC), 3C-SiC, and amorphous SiC (a-SiC) with thicknesses in the range of t~250nm−1.6μm, we have prototyped a series of stencil masks, with nanoscale features routinely down to ~100nm.

The effect of stoichiometry on the microstructure and properties of lead lanthanum titanate thin films

1995 ◽  
Vol 10 (11) ◽  
pp. 2777-2787 ◽  
Author(s):  
Ashraf R. Khan ◽  
Seshu B. Desu
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Relative Permittivity ◽  
Room Temperature ◽  
Optical Transmittance ◽  
High Resistivity ◽  
Charge Storage ◽  
Electrical Measurements ◽  
Storage Density ◽  
Lanthanum Titanate

Thin films of Lead Lanthanum Titanate (PLT) corresponding to 28 at. % of La were prepared by the metal-organic decomposition (MOD) process. The films were fabricated from two solutions of different composition. The composition of the first solution was determined, assuming that the incorporation of La3+ in the PbTiO3 structure gives rise to A-site or Pb vacancies, whereas for the composition of the other solution the creation of B-site or Ti vacancies was assumed. The effect of excess lead on the microstructure and the optical and electrical properties was studied for 0% to 20% excess PbO. The x-ray diffraction patterns of all films at room temperature indicated a cubic structure with a lattice constant of 3.92 Å. Optical and electrical measurements showed the films made assuming B-site vacancies had better properties. In general, excess PbO was found to improve the optical transmittance as well as the electrical properties of films. However, in films assuming the formation of B-site vacancies, PLT showed improved electrical properties only up to 5–10% excess PbO, while higher PbO additions had a deleterious effect. The films had a high resistivity, good relative permittivity, low loss, very low leakage current density, and high charge storage density. A type-B film with 10% excess Pb had a relative permittivity of 1340 at 100 kHz and a charge storage density of around 16.1 μC/cm2 at a field of 200 kV/cm at room temperature.

Fabrication and Characterization of RF Plasma Polymerized Thin Films from 3,7-Dimethyl-1,6-octadien-3-ol for Electronic and Biomaterial Applications

2010 ◽  
Vol 123-125 ◽  
pp. 323-326 ◽  
Author(s):  
Kateryna Bazaka ◽  
Mohan V. Jacob ◽  
Robert A. Shanks
Keyword(s):  
Thin Films ◽  
Optical Band Gap ◽  
Energy Gap ◽  
Polymer Chains ◽  
Rf Plasma ◽  
Circuit Boards ◽  
Average Roughness ◽  
Free Surfaces ◽  
Complete Dissociation

Poly(linalool) thin films were fabricated using RF plasma polymerisation. All films were found to be smooth, defect-free surfaces with average roughness of 0.44 nm. The FTIR analysis of the polymer showed a notable reduction in –OH moiety and complete dissociation of C=C unsaturation compared to the monomer, and presence of a ketone band absent from the spectrum of the monomer. Poly(linalool) were characterised by chain branching and a large quantity of short polymer chains. Films were optically transparent, with refractive index and extinction coefficient of 1.55 and 0.001 (at 500 nm) respectively, indicating a potential application as an encapsulating (protective) coating for circuit boards. The optical band gap was calculated to be 2.82 eV, which is in the semiconducting energy gap region.

Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

2014 ◽  
Vol 951 ◽  
pp. 104-108
Author(s):  
Xing Fa Zi ◽  
Rui Ming Liu ◽  
Qing Ye ◽  
Xin Zhu Shu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rate Ratio ◽  
Room Temperature ◽  
Single Phase ◽  
Optical Band Gap ◽  
Flow Rate Ratio ◽  
Pulse Magnetron ◽  
Sputtering Power ◽  
Reactive Pulse

N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target. Crystalline phases of thin films were controlled by adjusting N2/ O2flow rate ratio and sputtering power precisely during the sputtering process, and the single phase of Cu2O(111) thin films were obtained at room temperature. The thin films deposited at different sputtering powers were characteristics of 2D growth and the root mean square (RMS) of surface roughness of thin films gradually increased with the increasing of sputtering power. The optical band gap (Eg) of thin films were in the range 2.18-2.35 eV, and slightly decreased with increasing of sputtering power from 45 W to 90 W.

Electrical conductivity studies of mixed phthalocyanine thin films

Open Physics ◽  
2005 ◽  
Vol 3 (1) ◽  
Author(s):  
Abraham Varghese ◽  
C. Menon
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Room Temperature ◽  
Optical Band Gap ◽  
Thermal Evaporation ◽  
Copper Phthalocyanine ◽  
Thermal Evaporation Technique ◽  
Nickel Phthalocyanine ◽  
Mixed Films ◽  
Evaporation Technique

AbstractThin films of mixed of Copper Phthalocyanine (CuPc) and Nickel Phthalocyanine (NiPc) are deposited onto a pure glass substrate by a simultaneous thermal evaporation technique at room temperature. The material D.C. electrical conductivity of films at room temperature and also films annealed at 523 K has been investigated. The optical absorption and band gaps of the films are also measured. The results show that the electrical resistance is lower for the mixed films compared with the pure samples and also the optical band gap decreases for the mixed samples compared to the pure samples.

Investigation of Optical Properties of ZnO/MnO2, ZnO/TiO2 and ZnO/MnO2/TiO2 Nanocomposites

2014 ◽  
Vol 938 ◽  
pp. 123-127 ◽  
Author(s):  
G. Shanmuganathan ◽  
I.B. Shameem Banu
Keyword(s):  
Optical Properties ◽  
Room Temperature ◽  
Optical Band Gap ◽  
Energy Gap ◽  
Visible Region ◽  
Solid State Reaction Method ◽  
Morphological Properties ◽  
Energy Dispersive Analysis ◽  
Reaction Method ◽  
Uv Visible

ZnO nanocomposites such as (ZnO)0.8(MnO2)0.2, (ZnO)0.8(TiO2)0.2and (ZnO)0.8(MnO2)0.1(TiO2)0.1were prepared by solid state reaction method at room temperature. The structural analysis was carried out with help of powder XRD to confirm the formation of the composites. The morphological properties and presence of elemental compositions were analyzed with scanning electron microscope and energy dispersive analysis spectroscopy respectively. Optical properties were studied with UV visible spectrophotometer. From the transmittance spectrum, it is concluded that the synthesized composite materials have the transmittance in the range of 80 to 95% in the visible region. The calculated optical band gap values for pure ZnO is 3.16 eV and the values are 3.7eV, 5.27eV and 4.46eV for the composites ZnO/MnO2, ZnO/TiO2and ZnO/MnO2/TiO2, respectively. The study has found that the ZnO/MnO2, ZnO/TiO2and ZnO/MnO2/TiO2composites have very large energy gap as that of insulator.

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