Spontaneous Lateral Modulations in InAlAs Buffer Layers Grown by MBE on InP Substrates

1995 ◽  
Vol 417 ◽  
Author(s):  
F. Peiró ◽  
A. Cornet ◽  
J. C. Ferrer ◽  
J. R. Morante ◽  
G. Halkias ◽  
...  

AbstractTransmission Electron Microscopy (TEM) and X-ray Diffraction (XRD) have been used to analyze the spontaneous appearance of lateral composition modulations in InyAl1−yAs (yIn.≅ 50%) buffer layers of single quantum well structures grown by molecular beam epitaxy on exact and vicinal (100) InP substrates, at growth temperatures in the range of 530°C–580°C. The influence of the growth temperature, substrate misorientation and epilayer mismatch on the InAlAs lateral modulation is discussed. The development of a self-induced quantum-wire like morphology in the In0.53Ga0.47As single quantum wells grown over the modulated buffers is also commented on.

1995 ◽  
Vol 406 ◽  
Author(s):  
D. T. Emerson ◽  
J. A. Smart ◽  
K. L. Whittingham ◽  
E. M. Chumbes ◽  
J. R. Shealy

AbstractBulk GaAsP, 20Å–500Å GaAsP/GaInP single quantum wells and 70 Å period GaAsP/GaInP superlattices were deposited on GaAs substrates by Flow Modulation Epitaxy. In these structures, the disordered GaInP is lattice matched while the GaAsP is in tension with the As mole fraction varying from 0.6 to 1. The structures were studied using asymmetric x-ray diffraction, 1K photoluminescence, Raman scattering, transmission electron microscopy and atomic force microscopy. Raman and x-ray diffraction are used to assess the structural quality of the superlattices, especially with regard to the presence/absence of superlattice x-ray satellites and disorder activated longitudinal acoustic phonons. A model including the effects of composition, strain, and confinement on longitudinal optic phonons is described and used to estimate the composition, using Raman scattering, in the thin, pseudomorphic GaAsP layers in the superlattices. Photoluminescence is used to assess the composition of the interfacial layers in the single quantum wells and to determine transition energies in the superlattices. In addition, analysis of the heterostructure luminescence, including prediction of the energy band alignment as calculated with the model solid theory corrected for strain, is found to suggest the presence of a type II band alignment in the heterostructures for some values of GaAsP composition. Finally, Raman scattering and x-ray diffraction are used to compare arsenide to phosphide interfaces in GaAs and InP-based heterostructures.


1995 ◽  
Vol 405 ◽  
Author(s):  
D. T. Emerson ◽  
J. A. Smart ◽  
K. L. Whittingham ◽  
E. M. Chumbes ◽  
J. R. Shealy

AbstractBulk GaAsP, 20Å-500Å GaAsP/GaInP single quantum wells and 70 Å period GaAsP/GaInP superlattices were deposited on GaAs substrates by Flow Modulation Epitaxy. In these structures, the disordered GaInP is lattice matched while the GaAsP is in tension with the As mole fraction varying from 0.6 to 1. The structures were studied using asymmetric x-ray diffraction, 1K photoluminescence, Raman scattering, transmission electron microscopy and atomic force microscopy. Raman and x-ray diffraction are used to assess the structural quality of the superlattices, especially with regard to the presence/absence of superlattice x-ray satellites and disorder activated longitudinal acoustic phonons. A model including the effects of composition, strain, and confinement on longitudinal optic phonons is described and used to estimate the composition, using Raman scattering, in the thin, pseudomorphic GaAsP layers in the superlattices. Photoluminescence is used to assess the composition of the interfacial layers in the single quantum wells and to determine transition energies in the superlattices. In addition, analysis of the heterostructure luminescence, including prediction of the energy band alignment as calculated with the model solid theory corrected for strain, is found to suggest the presence of a type II band alignment in the heterostructures for some values of GaAsP composition. Finally, Raman scattering and x-ray diffraction are used to compare arsenide to phosphide interfaces in GaAs and InP-based heterostructures.


1987 ◽  
Vol 103 ◽  
Author(s):  
Jichai Jeong ◽  
J. C. Lee ◽  
M. A. Shahid ◽  
T. E. Schlesinger ◽  
A. G. Milnes

ABSTRACTX-ray diffraction, transmission electron microscopy (TEM), and photoluminescence measurements have been made on strained InxGa1-xAs/GaAs quantum well structures. The well widths measured from TEM are 187, 115 and 69 Å for an interrupted growth, and 218, 126, 60 Å for a non-interrupted growth. In the measured x-ray diffraction patterns, the Pendellosung fringes due to GaAs barriers are modulated by a broad weak peak mostly coming from the thickest InxGa1-xAs well layer and is fairly symmetric for the noninterrupted sample. For the interrupted quantum well, the x-ray diffraction pattern is less symmetric, since there is further modulation by another broader and weaker peak. This results show that the In content in the InxGa1-xAs well layers are not well controlled for the interrupted quantum well. Using actual thickness measured from TEM, x-ray diffraction patterns are calculated and good agreement is obtained between the measured and the calculated x-ray diffraction patterns. The three strained InxGa1-xAs/Gaks quantum wells grown without interruption produce high intensity and narrow full-width at half-maximum (FWHIM) of 2.9 meV of the photoluminescence peak. The photoluminescence peaks for the interrupted quantum well are relatively broad and asymmetric, and have lower intensities, indicating that better quality InxGa1-xAs/GaAs quantum wells can be grown without interruption.


1992 ◽  
Vol 242 ◽  
Author(s):  
G. C. Hua ◽  
N. Otsuka ◽  
W. Xie ◽  
D. C. Grillo ◽  
M. Kobayashi ◽  
...  

ABSTRACTZnSe/ZnCdSe diode structures were grown on (In, Ga)As buffer layers by molecular beam epitaxy. Lattice distortions and defect distributions in buffer layers and diode structures were examined by X-ray diffraction and transmission electron microscopy. Diode structrues with low dislocation densities were obtained by the growth on tetragonally distorted In0.043 Ga0.957 buffer layers, the lattice spacing of which is slightly smaller than that of ZnSe.


2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Mikolaj Grabowski ◽  
Ewa Grzanka ◽  
Szymon Grzanka ◽  
Artur Lachowski ◽  
Julita Smalc-Koziorowska ◽  
...  

AbstractThe aim of this paper is to give an experimental evidence that point defects (most probably gallium vacancies) induce decomposition of InGaN quantum wells (QWs) at high temperatures. In the experiment performed, we implanted GaN:Si/sapphire substrates with helium ions in order to introduce a high density of point defects. Then, we grew InGaN QWs on such substrates at temperature of 730 °C, what caused elimination of most (but not all) of the implantation-induced point defects expanding the crystal lattice. The InGaN QWs were almost identical to those grown on unimplanted GaN substrates. In the next step of the experiment, we annealed samples grown on unimplanted and implanted GaN at temperatures of 900 °C, 920 °C and 940 °C for half an hour. The samples were examined using Photoluminescence, X-ray Diffraction and Transmission Electron Microscopy. We found out that the decomposition of InGaN QWs started at lower temperatures for the samples grown on the implanted GaN substrates what provides a strong experimental support that point defects play important role in InGaN decomposition at high temperatures.


2003 ◽  
Vol 240 (2) ◽  
pp. 297-300 ◽  
Author(s):  
T. M. Smeeton ◽  
M. J. Kappers ◽  
J. S. Barnard ◽  
M. E. Vickers ◽  
C. J. Humphreys

1998 ◽  
Vol 537 ◽  
Author(s):  
Nicolas Grandjean ◽  
Jean Massies ◽  
Mathieu Leroux ◽  
Marguerite Latigt ◽  
Pierre Lefebvre ◽  
...  

AbstractAIGaN/GaN quantum well (QWs) were grown on (0001) sapphire substrates by molecular beam epitaxy (MBE) using ammonia as nitrogen precursor. The Al composition in the barriers was varied between 8 and 27 % and the well thickness from 4 to 17 monolayers (MLs, 1ML = 2.59Å). X-ray diffraction (XRD) experiments are used to investigate the strain state of both the well and the barriers. The QW transition energy are measured by low temperature photoluminescence (PL). A large quantum confined Stark effect is observed leading to QW luminescence much lower than the emission line of the GaN buffer layer for well width above a certain critical thickness. The built-in electric field responsible for such a phenomenon is deduced from fit of the PL data. Its magnitude is of several hundred kV/cm and increases linearly with the Al composition.


1999 ◽  
Vol 572 ◽  
Author(s):  
Stefan Zollner ◽  
Atul Konkar ◽  
R. B. Gregory ◽  
S. R. Wilson ◽  
S. A. Nikishin ◽  
...  

ABSTRACTWe measured the ellipsometric response from 0.7–5.4 eV of c-axis oriented AlN on Si (111) grown by molecular beam epitaxy. We determine the film thicknesses and find that for our AlN the refractive index is about 5–10% lower than in bulk AlN single crystals. Most likely, this discrepancy is due to a low film density (compared to bulk AlN), based on measurements using Rutherford backscattering. The films were also characterized using atomic force microscopy and x-ray diffraction to study the growth morphology. We find that AlN can be grown on Si (111) without buffer layers resulting in truely two-dimensional growth, low surface roughness, and relatively narrow x-ray peak widths.


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