scholarly journals The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process

2001 ◽  
Vol 689 ◽  
Author(s):  
Shara S. Shoup ◽  
Marvis K. White ◽  
Steve L. Krebs ◽  
Natalie Darnell ◽  
Adam C. King ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Critical Current Density ◽  
Buffer Layer ◽  
Critical Current ◽  
Vapor Deposition ◽  
Low Cost ◽  
Chemical Vapor ◽  
High Critical Current Density ◽  
High Quality

ABSTRACTThe innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS). In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. A buffer layer architecture of strontium titanate and ceria have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and microstructures to provide templates for growing PLD YBCO with high critical current density values. The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over 1 MA/cm2. Work is currently in progress to combine both the buffer layer and superconductor technologies to produce high-quality coupons of HTS tape made entirely by the non-vacuum CCVD process.

High-Temperature Superconducting Tapes Deposited by the Non-Vacuum, Low-Cost Combustion Chemical Vapor Deposition Technique

2000 ◽  
Vol 659 ◽  
Author(s):  
Marvis K. White ◽  
Ian H. Campbell ◽  
Adam C. King ◽  
Steve L. Krebs ◽  
Dave S. Mattox ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Vapor Deposition ◽  
Low Cost ◽  
High Temperature Superconductors ◽  
Continuous Production ◽  
Chemical Vapor ◽  
Capital Requirements ◽  
Current Status ◽  
Vapor Deposition Technique

ABSTRACTThe enormous technological potential of high-temperature superconductors (HTS) was realized immediately following their discovery in 1986, yet these materials largely remain laboratory curiosities as scientists struggle to scale from coupons to long lengths of practical coated conductor. Although both vacuum and non-vacuum processes are being investigated for commercial production, low-throughput vacuum techniques were the first to succeed in producing the buffer and superconducting layers necessary for superconducting tape with high critical currents. However, vacuum processes are not only expensive but impractical when addressing the needs for rapid production of kilometer lengths of wire. The innovative Combustion Chemical Vapor Deposition (CCVD) method used with the Rolling Assisted Biaxially Textured Substrates (RABiTS™) technology has shown significant promise in fabricating the multi-layer structures necessary for successful HTS tape while overcoming many of the shortcomings of traditional vacuum techniques. The key advantage of the CCVD technology is its ability to deposit high quality thin films in the open atmosphere using inexpensive precursor chemicals in solution. As a result, continuous, production-line manufacturing is possible with significantly reduced capital requirements and operating costs when compared to competing vacuum-based technologies. The current status of development for production of long lengths of high-temperature superconductors using CCVD will be discussed.

Metal-Organic Chemical Vapor Deposition of Metal Oxides: from Precursor Synthesis to Thin Films

1999 ◽  
Vol 574 ◽  
Author(s):  
J. A. Belot ◽  
A. Wang ◽  
N. L. Edleman ◽  
J. R. Babcock ◽  
M. V. Metz ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Low Cost ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
High Quality ◽  
Main Group Metal ◽  
Precursor Synthesis ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

AbstractThis contribution describes the synthesis, characterization, and implementation of new lanthanide and main group metal-organic chemical vapor deposition precursors based on the 2,2-dimethyl-5-N-2-methoxyethylimino-3-hexanonato ligand system. The new homoleptic, fluorinefree, low melting, and highly volatile complexes are ideally suited for oxide MOCVD, and in many applications are superior to standard β-diketonates while maintaining ease of synthesis and low cost. This is explicitly demonstrated by the growth of high quality CeO2/YBa2Cu3O7-δ multilayers.

A Review of Three Major Factors Controlling Carbon Nanotubes Synthesis from the Floating Catalyst Chemical Vapor Deposition

Nano LIFE ◽  
2019 ◽  
Vol 09 (04) ◽  
pp. 1930002 ◽  
Author(s):  
Daniel Rui Chen ◽  
Megha Chitranshi ◽  
Mark Schulz ◽  
Vesselin Shanov
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
High Temperature ◽  
Vapor Deposition ◽  
Mass Production ◽  
Arc Discharge ◽  
Low Cost ◽  
Chemical Vapor ◽  
Major Factors ◽  
Catalyst Chemical Vapor Deposition

After the discovery of carbon nanotubes (CNTs) by Sumio Iijima in 1991, several methods have been developed to synthesize them. High-temperature techniques, such as laser ablation and arc discharge, are now replaced by a low-temperature technique like chemical vapor deposition (CVD). Floating catalyst chemical vapor deposition (FCCVD) method is extensively researched due to its ease of fabrication, mass production at low cost and high purity output. The motive of this paper is to discuss the influence of three major factors on the growth of CNTs using the FCCVD method, which can help us better understand the process of FCCVD as well as the potential challenges faced by this method.

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