Characterization of SiC nanowires grown by APCVD using single precursors

2004 ◽  
Vol 832 ◽  
Author(s):  
Dae-Ho Rho ◽  
Jae-Soo Kim ◽  
Dong-Jin Byun ◽  
Jae-Woong Yang ◽  
Jae-Hoon Lee ◽  
...  

ABSTRACTSiC nanowire was grown by APCVD using single precursors. Grown SiC nanowires had 10∼60nm diameters and lengths of several micrometers. Nanowire's diameters and lengths were varied with kind of catalysts. Nanowire's growth scheme was divided by two regions with diameter of nanowire. At first region, nanowire was grown by VLS (vapor-liquid-solid) mechanism, but at the second region, nanowire growth was made by VS (vapor-solid) reaction. These differences were made from limitations of growth rate and deactivation effects. Growth temperature, time and flow rates of source gases were affected nanowire's diametesr and its lengths. And kind of catalysts, coating methods and precursors were affected growth direction and microstructures too.

2004 ◽  
Vol 449-452 ◽  
pp. 701-704 ◽  
Author(s):  
Daeho Rho ◽  
Jae Soo Kim ◽  
Dong Jin Byun ◽  
Jae Woong Yang ◽  
Jung Geun Jhin ◽  
...  

SiC nanorod was grown by APCVD using TMS. Grown SiC nanorods had a 10 ~ 60nm diameters and lengths of several micrometers. Nanorod.s diameters and lengths were different by kind of catalysts. Nanorod.s growth scheme was divided by two regions with diameter.s variations. At first region, nanorod was grown by VLS mechanism, but at the second region, nanorod growth was made by VS reaction. These differences were made from limitations of growth rate and deactivation effects. Growth temperature, time and flow rates of source gases were affected nanorod.s diameters and its lengths. And the kind of catalysts and coating methods were affected growth direction and microstructures too.


2006 ◽  
Vol 6 (11) ◽  
pp. 2598-2602 ◽  
Author(s):  
Maher Soueidan ◽  
Gabriel Ferro ◽  
Bilal Nsouli ◽  
Mohamad Roumie ◽  
Efstathios Polychroniadis ◽  
...  

2016 ◽  
Vol 4 (18) ◽  
pp. 3890-3897 ◽  
Author(s):  
Christopher W. Pinion ◽  
Joseph D. Christesen ◽  
James F. Cahoon

Bottom-up, chemical methods to control the morphology of semiconductor nanostructures are a promising complement to the top-down fabrication techniques that currently dominate the semiconductor industry.


Materials ◽  
2020 ◽  
Vol 13 (22) ◽  
pp. 5179
Author(s):  
Chuchu Guo ◽  
Laifei Cheng ◽  
Fang Ye ◽  
Qing Zhang

We report on the growth of SiC nanowires on a single crystal Si substrate by pyrolysis of polycarbosilane and using two catalyst (Al2O3 and Ni) films with different thickness (2, 4, and 6 nm). The catalyst films were deposited on the Si substrate, and the SiC nanowires were grown according to two mechanisms, i.e., the oxide-assisted growth mechanism and vapor- liquid-solid mechanism. As a result, pearl-chain-like SiC nanowires and straight SiC nanowires were obtained. The prepared nanowires exhibited excellent photoluminescence properties, emission spectra displaying two emission peaks at 395 and 465 nm, and have good thermal stability below 1000 °C. The experimental results revealed the importance of the catalyst in controlling the morphology and properties of SiC nanowires.


2005 ◽  
Vol 87 (20) ◽  
pp. 203101 ◽  
Author(s):  
J. C. Harmand ◽  
G. Patriarche ◽  
N. Péré-Laperne ◽  
M-N. Mérat-Combes ◽  
L. Travers ◽  
...  

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