High Power Optical Coatings by Atomic Layer Deposition and Signatures of Laser-Induced Damage

2012 ◽  
Author(s):  
Joseph J. Talghader
Keyword(s):  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Optical Coatings ◽  
Layer Deposition ◽  
Laser Induced Damage

scholarly journals Bottom-Up Fabrication of Oxygen Reduction Electrodes with Atomic Layer Deposition for High-Power-Density PEMFCs

2021 ◽  
Vol 2 (1) ◽  
pp. 100297
Author(s):  
Samuel M. Dull ◽  
Shicheng Xu ◽  
Timothy Goh ◽  
Dong Un Lee ◽  
Drew Higgins ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Oxygen Reduction ◽  
Power Density ◽  
High Power ◽  
Atomic Layer ◽  
High Power Density ◽  
Bottom Up ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

Optical coatings in microscale channels by atomic layer deposition

2010 ◽  
Vol 49 (8) ◽  
pp. 1242 ◽  
Author(s):  
Nicholas T. Gabriel ◽  
Joseph J. Talghader
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Optical Coatings ◽  
Layer Deposition

Laser Damage Properties of Optical Coatings with Nanoscale Layers Grown by Atomic Layer Deposition

2004 ◽  
Vol 43 (3) ◽  
pp. 1034-1035 ◽  
Author(s):  
Shin-ichi Zaitsu ◽  
Shinji Motokoshi ◽  
Takahisa Jitsuno ◽  
Masahiro Nakatsuka ◽  
Tatsuhiko Yamanaka
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Laser Damage ◽  
Optical Coatings ◽  
Layer Deposition

scholarly journals The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology

Nanomaterials ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 3282
Author(s):  
Guibai Xie ◽  
Hongwu Bai ◽  
Guanghui Miao ◽  
Guobao Feng ◽  
Jing Yang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
High Power ◽  
Manufacturing Industry ◽  
Secondary Electron ◽  
Atomic Layer ◽  
Manufacturing Technology ◽  
Advanced Manufacturing Technology ◽  
Advanced Manufacturing ◽  
Aerospace Manufacturing ◽  
Layer Deposition

With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry. In this paper, we report the applications of ultra-thin atomic layer deposition nanofilm in the advanced aerospace manufacturing industry, including aluminum anti-oxidation and secondary electron suppression, which are critical in high-power and miniaturization development. The compact and uniform aluminum oxide film, which is formed by thermal atomic layer deposition (ALD), can prevent the deep surface oxidation of aluminum during storage, avoiding the waste of material and energy in repetitive production. The total secondary electron yield of the C/TiN component nanofilm, deposited through plasma-enhanced atomic layer deposition, decreases 25% compared with an uncoated surface. The suppression of secondary electron emission is of great importance in solving the multipactor for high-power microwave components in space. Moreover, the controllable, ultra-thin uniform composite nanofilm can be deposited directly on the complex surface of devices without any transfer process, which is critical for many different applications. The ALD nanofilm shows potential for promoting system performance and resource consumption in the advanced aerospace manufacturing industry.

Conformal optical coatings on complex 3D macrostructures using atomic layer deposition

2021 ◽  
Author(s):  
John-Olof Rönn ◽  
Mikko Konttinen ◽  
Kalle Niiranen ◽  
Mikael Saarniheimo ◽  
Sami Sneck
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Optical Coatings ◽  
Layer Deposition
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