scholarly journals Optical properties of X-ray irradiated Cu6PS5I-based thin films deposited by magnetron sputtering

2017 ◽  
Vol 41 (0) ◽  
pp. 7-13
Author(s):  
Ihor Petrovych Studenyak ◽  
Andrii Vasyliovych Bendak ◽  
Mykola Oleksiyovych Vizenko ◽  
Vitalii Yuriyovych Izai ◽  
Andrii Mykhailovych Solomon ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
X Ray

scholarly journals Surface Stoichiometry and Optical Properties of Cux–TiyCz Thin Films Deposited by Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 551 ◽  
Author(s):  
Avishek Roy ◽  
Arun Kumar Mukhopadhyay ◽  
Sadhan Chandra Das ◽  
Gourab Bhattacharjee ◽  
Abhijit Majumdar ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Metal Matrix ◽  
Optical Band Gap ◽  
Matrix Composites ◽  
X Ray ◽  
Peak Intensity ◽  
Ternary Carbide

Ternary carbide in metal matrix composites constitute a big challenge in the industry, and in this regard their surface treatment is one of the most important issues. Ternary carbide (CuxTiyCz, where x, y and z are integers) thin films are synthesized by magnetron sputtering and characterized with respect to the film depth. X-ray photoelectron spectroscopy (XPS) of Cu-2p and Ti-2p peaks shows the associated shake-up satellite peaks at a smaller film depth; the peak intensity is reduced at a higher depth. The relative intensity of Cu and Ti increases at a larger film depth. The optical band gap varies from 1.83 to 2.20 eV at different film depths.

Effects of Annealing Temperature on Optical Properties of Bi3.4Nd0.6Ti3O12 Films by RF Magnetron Sputtering Method

2012 ◽  
Vol 503-504 ◽  
pp. 620-624
Author(s):  
Yan Zou ◽  
Qiu Xiang Liu ◽  
Yan Ping Jiang ◽  
Xin Gui Tang
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Band Gap ◽  
Annealing Temperature ◽  
Rf Magnetron Sputtering ◽  
Constant Thickness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Annealing Temperatures

Bi3.4Nd0.6Ti3O12 (BNT) thin films have been prepared on Si (100) substrate by RF magnetron sputtering method. The crystalline structures were studied by X-ray diffraction. The surface of the films have been observed by SEM. The reflectivity was measured by n & k Analyzer 2000 with the wavelength from 190 to 900 nm. The optical constant, thickness and the forbidden band gap were fitted. The results showed that with the annealing temperatures raised from 600 to 750 °C, the reflectivity index decreased from 2.224 to 2.039, and the forbidden band gap decreased from 3.19 to 2.99 eV. The possible mechanism of the effect of annealing temperature on the optical properties was discussed.

Effects of Vapor CdCl2 Treatment on the Properties of CdS Thin Films Prepared by R.F. Magnetron Sputtering

2011 ◽  
Vol 347-353 ◽  
pp. 3477-3480
Author(s):  
Liang Min Cai ◽  
Jian Huang ◽  
Jia Wei Jiang ◽  
Jun Le ◽  
Wei Min Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Solar Cell Application ◽  
X Ray ◽  
Cds Thin Films ◽  
Cds Films

CdS films were prepared by R.F. magnetron sputtering method. The effects of vapor CdCl2treatment on the properties of CdS films were studied. The vapor CdCl2thermal treatment at different temperature was employed in a CSS device, using CdCl2powder as evaporant. The structural and optical properties of CdS films were investigated by x-ray diffraction (XRD), PL spectra, and transmittance spectra, respectively. The results revealed that the CdS films had a structure of hexagonal wurtzite with a preferential orientation of the (002) plane. A better crystal quality and larger grain size, which are good for the solar cell application, were observed in the CdS samples annealed with CdCl2Subscript text.

INFLUENCE OF THE SUBSTRATE TEMPERATURE ON TiO2 THIN LAYERS DEPOSITED BY THE DIRECT CURRENT MAGNETRON SPUTTERING TECHNOLOGY

2020 ◽  
pp. 2050054
Author(s):  
RADOUANE GRAINE ◽  
KHOULOUD BEDOUD ◽  
NADJETTE SEHAB ◽  
DJAMEL ZELMATI
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Extinction Coefficient ◽  
Future Application ◽  
X Ray ◽  
Uv Visible ◽  
Substrate Temperatures

In this study, Anatase thin films of titanium dioxide (TiO[Formula: see text] are deposited by the Direct Current (DC) magnetron sputtering technique on glass substrate for future application in gas sensors. In our work, we focused and discussed the effect of various substrate temperatures [Formula: see text]C, [Formula: see text]C and [Formula: see text]C, and film thicknesses 142, 220 and 410[Formula: see text]nm, respectively, in order to study the structural and optical properties of the TiO2 thin films. The crystalline structure and optical properties of TiO2 nanoparticles were investigated using X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Energy-Dispersive X-ray Spectroscopy (EDS), Atomic Force Microscopy (AFM), Raman spectroscopy and UV–visible spectroscopy. The formation of the Anatase TiO2 with Tetragonal crystal structure has been confirmed with XRD. UV–visible spectrophotometry characterization of the developed thin films showed that all the films had an optical transmission greater than 92% in the visible region. In addition, the obtained direct and indirect optical band gaps using the Tauc plot are 3.66, 3.34[Formula: see text]eV at [Formula: see text]C 3.74, 3.37[Formula: see text]eV at [Formula: see text]C and 3.71, 3.37[Formula: see text]eV at [Formula: see text]C, respectively. Forouhi–Bloomer (FB) physical model has been used to obtain the refractive index and extinction coefficient by fitting theoretical transmittance curves to experimental ones. The optical refractive index is found to vary from 2.350 for [Formula: see text]C, 2.1499 for [Formula: see text]C and 2.1420 for [Formula: see text]C. Moreover, we have obtained an extinction coefficient [Formula: see text] ([Formula: see text] of around [Formula: see text] for both substrate temperatures [Formula: see text]C and [Formula: see text]C, and around [Formula: see text] for the [Formula: see text]C.

Structural and optical properties of Tin Oxide and Indium doped SnO2 thin films deposited by thermal evaporation technique

2016 ◽  
Vol 12 (3) ◽  
pp. 4394-4399
Author(s):  
Sura Ali Noaman ◽  
Rashid Owaid Kadhim ◽  
Saleem Azara Hussain
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tin Oxide ◽  
Thermal Evaporation ◽  
Pure Sno2 ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Evaporation Technique ◽  
Sno2 Thin Films

Tin Oxide and Indium doped Tin Oxide (SnO2:In) thin films were deposited on glass and Silicon  substrates  by  thermal evaporation technique.  X-ray diffraction pattern of  pure SnO2 and SnO2:In thin films annealed at 650oC and the results showed  that the structure have tetragonal phase with preferred orientation in (110) plane. AFM studies showed an inhibition of grain growth with increase in indium concentration. SEM studies of pure  SnO2 and  Indium doped tin oxide (SnO2:In) ) thin films showed that the films with regular distribution of particles and they have spherical shape.  Optical properties such as  Transmission , optical band-gap have been measured and calculated.

scholarly journals Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films

Surfaces ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 106-114
Author(s):  
Yannick Hermans ◽  
Faraz Mehmood ◽  
Kerstin Lakus-Wollny ◽  
Jan P. Hofmann ◽  
Thomas Mayer ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Fast Method ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Post Annealing ◽  
Rf Signal ◽  
First Time

Thin films of ZnWO4, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO4 thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO4 thin films.

Effect of morphology on supercapacitive and optical properties of chemically grown Graphene-Nickel Oxide nanocomposites

2020 ◽  
Vol 34 (26) ◽  
pp. 2050229
Author(s):  
Fatemeh Zahraei ◽  
Ferydon Babaei ◽  
Ali Ehsani
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Nickel Oxide ◽  
Optical Data ◽  
X Ray ◽  
Capacitive Behavior ◽  
Liquid Phase Exfoliation ◽  
Grown Graphene ◽  
Hydrothermal Methods ◽  
Absorbance Spectra

Graphene-Nickel Oxide (G-NiO) nanocomposites with different morphologies, such as nanowires (NWs), nanorods (NRs) and nanoparticles (NPs), are synthesized by a combination of liquid-phase exfoliation (LPE) and hydrothermal methods. The synthesis of Graphene, morphology of Nickel Oxide (NiO) thin films and concentration of elements are analyzed using Raman Spectroscopy, Field Emission Scanning Electron Microscopy (FESEM) and Energy-dispersive X-ray spectroscopy (EDS), respectively. Furthermore, the capacitive behavior of nanocomposites is investigated using the Cyclic Voltammetry (CV). The optical properties of samples are extracted from measured absorbance spectra. Our results show that G-NiO NWs with the longest length have the largest specific capacitance (SC). In addition, optical data revealed that the adding Graphene to NiO thin films decreased the optical bandgap as well as the optical conductivity of nanocomposites increased with photon energy due to excitation electrons.

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