scholarly journals Organic thin films formation by laser ablation in a magnetic field.

1995 ◽  
Vol 8 (3) ◽  
pp. 449-456
Author(s):  
TATSUYA IMURA ◽  
YOSHINORI DAKE ◽  
SHUHEI TATSUMI ◽  
SHOJI KAMIYA ◽  
CHIAKI NAGAI ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Laser Ablation ◽  
Organic Thin Films

scholarly journals Organic thin films formation by laser ablation.

1993 ◽  
Vol 6 (3) ◽  
pp. 429-432 ◽  
Author(s):  
KENJIN HIGAKI ◽  
CHIAKI NAGAI ◽  
OSAMU MURATA ◽  
HAYAMI ITOH
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Organic Thin Films

Effect of magnetic field on growth of functional organic thin films

1999 ◽  
Vol 338 (1-2) ◽  
pp. 300-303 ◽  
Author(s):  
Tatsuo Mori ◽  
Kenjiro Mori ◽  
Teruyoshi Mizutani
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Organic Thin Films

scholarly journals Characteristics of organic thin films fabricated by laser ablation deposition.

1995 ◽  
Vol 8 (3) ◽  
pp. 469-474 ◽  
Author(s):  
Takeo FUJII ◽  
Hiroki SHIMA ◽  
Naotaka MATSUMOTO ◽  
Fumihiko KANNARI
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Organic Thin Films

Organic thin films formation by laser ablation

1994 ◽  
pp. 293-296
Author(s):  
K. Higaki ◽  
T. Imura ◽  
C. Nagai ◽  
O. Murata ◽  
H. Itoh
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Organic Thin Films

Electrical and optical characteristics of organic thin films fabricated by laser ablation

1996 ◽  
Vol 96-98 ◽  
pp. 625-629 ◽  
Author(s):  
T. Fujii ◽  
H. Shima ◽  
N. Matsumoto ◽  
F. Kannari
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Organic Thin Films ◽  
Optical Characteristics

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Electrical Anisotropy of Thin Metal Films Growing on Dielectric Substrates

2002 ◽  
Vol 7 (2) ◽  
pp. 45-52
Author(s):  
L. Jakučionis ◽  
V. Kleiza
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Uniaxial Anisotropy ◽  
Metal Films ◽  
Thin Layers ◽  
Electrical Anisotropy ◽  
Electrical Field ◽  
Dielectric Substrates ◽  
Unequal Probability ◽  
Conductive Thin Films

Electrical properties of conductive thin films, that are produced by vacuum evaporation on the dielectric substrates, and which properties depend on their thickness, usually are anisotropic i.e. they have uniaxial anisotropy. If the condensate grow on dielectric substrates on which plane electrical field E is created the transverse voltage U⊥ appears on the boundary of the film in the direction perpendicular to E. Transverse voltage U⊥ depends on the angle γ between the applied magnetic field H and axis of light magnetisation. When electric field E is applied to continuous or grid layers, U⊥ and resistance R of layers are changed by changing γ. It means that value of U⊥ is the measure of anisotropy magnitude. Increasing voltage U0 , which is created by E, U⊥ increases to certain magnitude and later decreases. The anisotropy of continuous thin layers is excited by inequality of conductivity tensor components σ0 ≠ σ⊥. The reason of anisotropy is explained by the model which shows that properties of grain boundaries are defined by unequal probability of transient of charge carrier.

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