Visible-Light Photosensitized Aryl and Alkyl Decarboxylative Carbon-Heteroatom and Carbon-Carbon Bond Formations

Author(s):  
Tuhin Patra ◽  
Satobhisha Mukherjee ◽  
Jiajia Ma ◽  
Felix Strieth-Kalthoff ◽  
Frank Glorius

<sub>A general strategy to access both aryl and alkyl radicals by photosensitized decarboxylation of the corresponding carboxylic acids esters has been developed. An energy transfer mediated homolysis of unsymmetrical sigma-bonds for a concerted fragmentation/decarboxylation process is involved. As a result, an independent aryl/alkyl radical generation step enables a series of key C-X and C-C bond forming reactions by simply changing the radical trapping agent.</sub>

2019 ◽  
Author(s):  
Frank Glorius ◽  
Tuhin Patra ◽  
Satobhisha Mukherjee ◽  
Jiajia Ma ◽  
Felix Strieth-Kalthoff

<sub>A general strategy to access both aryl and alkyl radicals by photosensitized decarboxylation of the corresponding carboxylic acids esters has been developed. An energy transfer mediated homolysis of unsymmetrical sigma-bonds for a concerted fragmentation/decarboxylation process is involved. As a result, an independent aryl/alkyl radical generation step enables a series of key C-X and C-C bond forming reactions by simply changing the radical trapping agent.</sub>


2019 ◽  
Author(s):  
Frank Glorius ◽  
Tuhin Patra ◽  
Satobhisha Mukherjee ◽  
Jiajia Ma ◽  
Felix Strieth-Kalthoff

<sub>A general strategy to access both aryl and alkyl radicals by photosensitized decarboxylation of the corresponding carboxylic acids esters has been developed. An energy transfer mediated homolysis of unsymmetrical sigma-bonds for a concerted fragmentation/decarboxylation process is involved. As a result, an independent aryl/alkyl radical generation step enables a series of key C-X and C-C bond forming reactions by simply changing the radical trapping agent.</sub>


2017 ◽  
Vol 8 ◽  
pp. 1863-1877 ◽  
Author(s):  
Rashanique D Quarels ◽  
Xianglin Zhai ◽  
Neepa Kuruppu ◽  
Jenny K Hedlund ◽  
Ashley A Ellsworth ◽  
...  

Visible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)3]2+ and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. This approach to radical generation has proven useful for the synthesis of small organic molecules. Herein, we demonstrate for the first time the visible-light photosensitized deposition of robust alkyl thin films on Au surfaces using phthalimide esters as the alkyl radical precursors. In particular, we combine visible-light photosensitization with particle lithography to produce nanostructured thin films, the thickness of which can be measured easily using AFM cursor profiles. Analysis with AFM demonstrated that the films are robust and resistant to mechanical force while contact angle goniometry suggests a multilayered and disordered film structure. Analysis with IRRAS, XPS, and TOF SIMS provides further insights.


ChemInform ◽  
2012 ◽  
Vol 43 (44) ◽  
pp. no-no
Author(s):  
Michael Pirtsch ◽  
Suva Paria ◽  
Taisuke Matsuno ◽  
Hiroyuki Isobe ◽  
Oliver Reiser

Synthesis ◽  
2019 ◽  
Vol 51 (05) ◽  
pp. 1063-1072 ◽  
Author(s):  
Alexandra Sun ◽  
Rory McAtee ◽  
Edward McClain ◽  
Corey Stephenson

The Minisci reaction, which encompasses the radical C–H alkylation of heteroarenes, has undergone revolutionary development in recent years. The application of photoredox catalysis to alkyl radical generation has given rise to a multitude of methods that feature enhanced functional group tolerance, generality, and operational simplicity. The intent of this short review is to bring readers up to date on this rapidly expanding field. Specifically, we will highlight key examples of visible-light-driven Minisci alkylation strategies that represent key advancements in this area of research. The scope and limitations of these transformations will be discussed, with a focus on examining the underlying pathways for alkyl radical generation. Our goal is to make this short review a stepping stone for further synthetic research development. Sections are organized based on alkyl radical precursor reagents.1 Introduction2 Alkyl Carboxylic Acids and Carboxylic Acid Derivatives3 Alkylboronic Acids4 Potassium Alkyl- and Alkoxymethyltrifluoroborates5 Alkyl Halides6 Alcohols and Ethers7 Conclusion


2017 ◽  
Vol 53 (84) ◽  
pp. 11544-11547 ◽  
Author(s):  
Linyong Li ◽  
Haoguo Chen ◽  
Mingjing Mei ◽  
Lei Zhou

A photoredox approach to generate distal cyano-substituted alkyl radicals through C–C bond cleavage of cyclobutanone oximes was developed.


2012 ◽  
Vol 18 (24) ◽  
pp. 7336-7340 ◽  
Author(s):  
Michael Pirtsch ◽  
Suva Paria ◽  
Taisuke Matsuno ◽  
Hiroyuki Isobe ◽  
Oliver Reiser

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