scholarly journals Electron Conduction Processes in Tantalum-Germanium Multilayers

2021 ◽  
Author(s):  
◽  
Heather Leigh Johnson

<p>An explosion of both theoretical and experimental research into structurally disordered materials in the late 1970s has greatly increased our understanding of these complex systems. A number of facets of the conduction processes remain unexplained, however, particularly in the area of non-simple metals. Multilayers of disordered tantalum and amorphous germanium with individual layer thicknesses of between 4 & 120A [Angstrom] and 13 & 220A [Angstrom]respectively have been prepared by vapour deposition and the in-plane resistance measured from 1.5 to 300K. Results for samples with germanium layers of sufficient thickness to prevent tunnelling between the conducting tantalum layers can be interpreted in terms of conduction in the tantalum layers alone. In these samples the behaviour of the resistance as a function of temperature and the tantalum layer thickness can be explained in terms of the interplay between quantum interference effects and disorder enhanced electron-electron interaction effects. At high temperatures the negative temperature coefficient of resistance arises from the destruction of coherent interference in the backscattered direction by phonons. From the data, the electron-phonon scattering rate is found to be comparable in magnitude to that expected for scattering in either the "clean" or "dirty" limits while the temperature dependence of the scattering rate lies between that expected for each of these limits. At lower temperatures a turn over to a positive temperature coefficient of resistance is seen as spin-orbit scattering and superconducting fluctuations become important. At still lower temperatures the resistance is dominated by electron-electron interaction effects and we have observed a transition from three-dimensional to two-dimensional behaviour as the tantalum layer thickness is reduced. Evidence for the onset of superconductivity is seen for samples with a low temperature sheet resistance of less than 3000 Omega/whitesquare. We have also investigated samples with thin germanium layers (<40A [Angstrom]) in which coupling between the layers causes an increase in the superconducting transition temperature. We present some preliminary measurements which suggest that the transition from isolated to coupled tantalum layers, as the germanium layer thickness is reduced, can be followed in the form of the fluctuation conductivity.</p>

2021 ◽  
Author(s):  
◽  
Heather Leigh Johnson

<p>An explosion of both theoretical and experimental research into structurally disordered materials in the late 1970s has greatly increased our understanding of these complex systems. A number of facets of the conduction processes remain unexplained, however, particularly in the area of non-simple metals. Multilayers of disordered tantalum and amorphous germanium with individual layer thicknesses of between 4 & 120A [Angstrom] and 13 & 220A [Angstrom]respectively have been prepared by vapour deposition and the in-plane resistance measured from 1.5 to 300K. Results for samples with germanium layers of sufficient thickness to prevent tunnelling between the conducting tantalum layers can be interpreted in terms of conduction in the tantalum layers alone. In these samples the behaviour of the resistance as a function of temperature and the tantalum layer thickness can be explained in terms of the interplay between quantum interference effects and disorder enhanced electron-electron interaction effects. At high temperatures the negative temperature coefficient of resistance arises from the destruction of coherent interference in the backscattered direction by phonons. From the data, the electron-phonon scattering rate is found to be comparable in magnitude to that expected for scattering in either the "clean" or "dirty" limits while the temperature dependence of the scattering rate lies between that expected for each of these limits. At lower temperatures a turn over to a positive temperature coefficient of resistance is seen as spin-orbit scattering and superconducting fluctuations become important. At still lower temperatures the resistance is dominated by electron-electron interaction effects and we have observed a transition from three-dimensional to two-dimensional behaviour as the tantalum layer thickness is reduced. Evidence for the onset of superconductivity is seen for samples with a low temperature sheet resistance of less than 3000 Omega/whitesquare. We have also investigated samples with thin germanium layers (<40A [Angstrom]) in which coupling between the layers causes an increase in the superconducting transition temperature. We present some preliminary measurements which suggest that the transition from isolated to coupled tantalum layers, as the germanium layer thickness is reduced, can be followed in the form of the fluctuation conductivity.</p>


2014 ◽  
Vol 778-780 ◽  
pp. 461-466 ◽  
Author(s):  
Hiroki Niwa ◽  
Jun Suda ◽  
Tsunenobu Kimoto

Impact ionization coefficients of 4H-SiC were measured at room temperature and at elevated temperatures up to 200°C. Photomultiplication measurement was done in two complementary photodiodes to measure the multiplication factors of holes (Mp) and electrons (Mn), and ionization coefficients were extracted. Calculated breakdown voltage using the obtained ionization coefficients showed good agreement with the measured values in this study, and also in other reported PiN diodes and MOSFETs. In high-temperature measurement, breakdown voltage exhibited a positive temperature coefficient and multiplication factors showed a negative temperature coefficient. Therefore, extracted ionization coefficient has decreased which can be explained by the increase of phonon scattering. The calculated temperature dependence of breakdown voltage agreed well with the measured values not only for the diodes in this study, but also in PiN diode in other literature.


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