Micro Patterning of Crystalline Structures on a-ITO Films on Plastic Substrates Using Femtosecond Laser

ITO films on PET in combination with ITO films on glass substrates are extensively used in Touch Panel Displays fabrication. Main properties of interest for these systems are high optical transmittance ∽95%, low resistivity ∽10−3 Ωcm, coupled with uniform and stable sheet resistivity demanded for long term use.The goal of this investigation is to understand relationship between microstructure and electrical/optical properties of ITO films on PET and glass substrates as a function of pre- and postdeposition annealing parameters.ITO films of ∽60 nm thick have been deposited by radiofrequency magnetron sputtering. This method can be applied over a wide range of substrate temperatures. This is essential for plastic substrates such as PET. Regions of good and poor conductivity have been identified for TEM analysis and Analytical Electron Microscope (Philips 400 EM), equipped with light element Noran Instrument Energy Dispersive X-ray Spectrometer (EDXS) have been utilized.

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In situ localized formation of cesium lead bromide nanocomposites for fluorescence micro-patterning technology achieved by organic solvent polymerization

Journal of Materials Chemistry C ◽

10.1039/c9tc06687j ◽

2020 ◽

Vol 8 (10) ◽

pp. 3409-3417 ◽

Cited By ~ 1

Author(s):

Louwen Zhang ◽

Yanan Liu ◽

Zongsong Gan ◽

Jun Su ◽

Yihua Gao

Keyword(s):

Femtosecond Laser ◽

Organic Solvent ◽

Laser Processing ◽

Processing Strategy ◽

Micro Patterning ◽

Femtosecond Laser Processing ◽

Lead Bromide

A femtosecond laser processing strategy was proposed to fabricate luminescent patterns composed of in situ crystallized cesium lead bromide nanocomposites.

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Electrical properties of crystalline ITO films prepared at room temperature by pulsed laser deposition on plastic substrates

Thin Solid Films ◽

10.1016/s0040-6090(02)00169-4 ◽

2002 ◽

Vol 411 (1) ◽

pp. 32-35 ◽

Cited By ~ 42

Author(s):

Hirokazu Izumi ◽

Tsuguo Ishihara ◽

Hideki Yoshioka ◽

Muneyuki Motoyama

Keyword(s):

Electrical Properties ◽

Pulsed Laser Deposition ◽

Room Temperature ◽

Pulsed Laser ◽

Laser Deposition ◽

Plastic Substrates ◽

Ito Films

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Micro-patterning of Indium thin film for generation of micron and submicron particles using femtosecond laser-induced forward transfer

Laser and Particle Beams ◽

10.1017/s0263034615000476 ◽

2015 ◽

Vol 33 (3) ◽

pp. 449-454 ◽

Cited By ~ 2

Author(s):

Kamlesh Alti ◽

Sudhanshu Dwivedi ◽

Santhosh Chidangil ◽

Deepak Mathur ◽

Alika Khare

Keyword(s):

Thin Film ◽

Femtosecond Laser ◽

Submicron Particles ◽

Donor Substrate ◽

Micro Patterning ◽

Close Proximity ◽

Forward Transfer ◽

Deposition Dose

AbstractThis paper reports on micro-pattering of Indium thin film (donor substrate) using a higher deposition dose than previously reported. The threshold deposition dose required for micro-patterning was measured. Ejected material from the micro-patterned thin film was deposited onto an accepter substrate kept in close proximity; it clearly shows deposition of micron and submicron particles of Indium. Moreover, a clean line like structure was deposited onto the accepter substrate when the accepter substrate was moved with the same velocity as that of the donor substrate.

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Laser-Crystallized High Quality ITO on Plastic Substrates for Flexible Displays

MRS Proceedings ◽

10.1557/proc-769-h10.1 ◽

2003 ◽

Vol 769 ◽

Cited By ~ 1

Author(s):

Wonsuk Chung ◽

Paul Wickboldt ◽

Daniel Toet ◽

Paul G. Carey ◽

Michael O. Thompson

Keyword(s):

Excimer Laser ◽

Laser Annealing ◽

Optical Transmittance ◽

Visible Range ◽

Type I ◽

Laser Crystallization ◽

High Quality ◽

Flexible Displays ◽

Plastic Substrates ◽

Ito Films

AbstractIn the study presented here, we successfully demonstrated that high quality ITO films could be obtained on plastic substrates using Excimer laser crystallization. ITO films were first deposited at 10 °C on PEN substrates by DC magnetron sputtering, and then irradiated using a homogenized pulsed XeCl excimer laser beam (308 nm, 35 ns pulse duration) in a vacuum chamber. It was possible to reliably attain Type I ITO films with sheet resistances down to 35 Ω/΢, combined with 80 % optical transmittance in visible range. Well defined 2 μm lines could be obtained using simple HCl etchant at room temperature. We also developed Type II ITO films with a sheet resistance of 15 Ω/΢ and an optical transmittance of 80 % by means of laser annealing on plastic substrates, although these materials were found inferior to Type I in etching properties.

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