scholarly journals Fabrication of High-Aspect-Ratio Cylindrical Micro-Structures Based on Electroactive Ionogel/Gold Nanocomposite

Applied Nano ◽  
2020 ◽  
Vol 1 (1) ◽  
pp. 59-69
Author(s):  
Edoardo Milana ◽  
Tommaso Santaniello ◽  
Paolo Azzini ◽  
Lorenzo Migliorini ◽  
Paolo Milani
Keyword(s):  
Aspect Ratio ◽  
Electric Fields ◽  
High Aspect Ratio ◽  
Polymer Nanocomposite ◽  
Potential Applications ◽  
Nanostructured Gold ◽  
Gold Nanocomposites ◽  
Micro Structures ◽  
Cluster Beam Deposition ◽  
Beam Deposition

We present a fabrication process to realize 3D high-aspect-ratio cylindrical micro-structures of soft ionogel/gold nanocomposites by combining replica molding and Supersonic Cluster Beam Deposition (SCBD). Cylinders’ metallic masters (0.5 mm in diameter) are used to fabricate polydimethylsiloxane (PDMS) molds, where the ionogel is casted and UV cured. The replicated ionogel cylinders (aspect ratio > 20) are subsequently metallized through SCBD to integrate nanostructured gold electrodes (150 nm thick) into the polymer. Nanocomposite thin films are characterized in terms of electrochemical properties, exhibiting large double layer capacitance (24 μF/cm2) and suitable ionic conductivity (0.05 mS/cm) for charge transport across the network. Preliminary actuation tests show that the nanocomposite is able to respond to low intensity electric fields (applied voltage from 2.5 V to 5 V), with potential applications for the development of artificial smart micro-structures with motility behavior inspired by that of natural ciliate systems.

High-Aspect-Ratio Electroplated Structures With 2μm Beamwidth

1999 ◽  
Author(s):  
Xiaobin Li ◽  
Siddharth Kiyawat ◽  
Hector J. De Los Santos ◽  
Chang-Jin “CJ” Kim
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Stress Gradient ◽  
Optimization Method ◽  
Nickel Layer ◽  
Driving Voltage ◽  
Aspect Ratios ◽  
Nickel Electroplating ◽  
Electroplating Process ◽  
Micro Structures

Abstract Narrow beamwidth is highly desirable for many micromechanical elements moving parallel to the substrate. A good example is the electrostatically driven flexure structure, whose driving voltage is determined by the width of the beam. This paper presents the process flow and the result of a high-aspect-ratio electroplating process using photoresist (PR) molds. Following a systematic optimization method, PR molds with aspect ratios up to 4.0 were fabricated with a beamwidth of only 2.1μm. Higher aspect ratios, up to 6.8, were achieved using PR double coating technique, with a beamwidth of 2.6μm. Using a Cr/Cu seed layer, nickel electroplating was successfully carried out to translate the PR molds into nickel micro-structures. We observed bend-down of the fully released nickel cantilevers that are over 8μm thick. Further investigation suggested a combined effect of residual stress gradient in the electroplated nickel layer and in-use stiction of the cantilever beams.

A study on the machining of high-aspect ratio micro-structures using micro-EDM

2003 ◽  
Vol 140 (1-3) ◽  
pp. 318-325 ◽  
Author(s):  
H.S. Lim ◽  
Y.S. Wong ◽  
M. Rahman ◽  
M.K. Edwin Lee
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Micro Edm ◽  
Micro Structures

A New Negative-Tone, UV Lithography Photoresist for Fabrication of Ultra-High-Aspect-Ratio Microstructures

2006 ◽  
Author(s):  
Ren Yang ◽  
Steven Soper ◽  
Wanjun Wang
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Sulfonium Salt ◽  
Ultraviolet Lithography ◽  
Uv Lithography ◽  
Aspect Ratios ◽  
Potential Applications ◽  
New Type ◽  
Preliminary Study ◽  
Negative Tone

We report a new type of negative-tone photoresist in this paper. The resist is based on the composite of EPON resins 154 165 (both from Hexion Specialty Chemicals, Inc., Columbus, OH 43215). These two epoxy resins were mixed in an optimal ratio and dissolved into the gamma-butyrolactone (GBL) solvent. The mixture was then photosensitized by adding a given amount of triaryl sulfonium salt to obtain the new negative tone photoresist that can be used in for ultra high aspect ratio microstructures with UV lithography. The preliminary study has found that microstructures with height of more than 1000 μm and feature sizes of 10 μm (aspect-ratios of more than 100) can be obtained using the new resist film with ultraviolet lithography. The microstructures have excellent sidewall quality. In this paper, both the material properties and lithography properties of this new type of UV resist will be presented. The potential applications of the new resist in microfabrication and MEMS systems are also discussed.

3D high aspect ratio micro structures fabricated by one step UV lithography

2007 ◽  
Vol 17 (2) ◽  
pp. 291-296 ◽  
Author(s):  
H Huang ◽  
W Yang ◽  
T Wang ◽  
T Chuang ◽  
C Fu
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Uv Lithography ◽  
One Step ◽  
Micro Structures

Laser Drilling on Elastomeric Polymers

2012 ◽  
Vol 591-593 ◽  
pp. 307-310
Author(s):  
Chun Lei Kang ◽  
Yan Xu ◽  
Kai Leung Yung ◽  
Wei Chen ◽  
Hang Liu
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Soft Lithography ◽  
Average Power ◽  
Pulsed Laser ◽  
Laser Drilling ◽  
Fabrication Method ◽  
Drilling Technology ◽  
Micro Features ◽  
Micro Structures

Elastomeric polymers have been used as moulds for fabricating micro structures in the soft lithography technology due to their elastic features and unstickiness to polymer features. Previously, the micro moulds were normally produced by imprinting on micro prototypes, which are fabricated using deep reactive etching or photolithography. In this paper, we introduce a direct mould fabrication method, which uses pulsed laser drilling technology to directly generate high aspect ratio patterns in elastomeric polymers. The effects of laser parameters such as pulse repetition rate and average power on the drilling qualities are systematically studied. The techniques presented in this paper would provide a more flexible way to fabricate high aspect ratio micro features on elastomer mould efficiently.

FORMATION OF ZnO NANOBRUSHES IN DIRECT ATMOSPHERE USING A CARBON CATALYST AND A Zn METAL SOURCE

NANO ◽  
2008 ◽  
Vol 03 (05) ◽  
pp. 361-365 ◽  
Author(s):  
SHUBRA SINGH ◽  
S. BHASKAR REDDY ◽  
M. KOTTAISAMY ◽  
M. S. RAMACHANDRA RAO
Keyword(s):  
Aspect Ratio ◽  
Piezoelectric Property ◽  
High Aspect Ratio ◽  
Activated Charcoal ◽  
Quartz Substrate ◽  
Source Material ◽  
Carbon Catalyst ◽  
Metal Source ◽  
Evaporation Method ◽  
Potential Applications

In this paper we report on the preparation of nanobrushes of ZnO on quartz substrate by a direct atmosphere evaporation method using Zn metal flakes. Activated charcoal was used as a catalyst that facilitated the formation of nanobrushes in which the brush stem was about 15–20 μm in length and the bristles (100–200 nm thick) were made up of nanofibrous ZnO whose tips were 10–15 nm in width and were angled in some cases. These aligned nanobrushes can find potential applications as nanopower generators and high aspect ratio AFM probes by virtue of the piezoelectric property of ZnO . This technique is simple for realizing aligned ZnO nanobrushes with metallic Zn as the source material.

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