scholarly journals Physical Properties of Fe3Si Films Coated through Facing Targets Sputtering after Microwave Plasma Treatment

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 923
Author(s):  
Nattakorn Borwornpornmetee ◽  
Peerasil Charoenyuenyao ◽  
Rawiwan Chaleawpong ◽  
Boonchoat Paosawatyanyong ◽  
Rungrueang Phatthanakun ◽  
...  
Keyword(s):  
Contact Angle ◽  
Surface Modification ◽  
Physical Properties ◽  
Plasma Treatment ◽  
Microwave Power ◽  
Microwave Plasma ◽  
Hydrophobic Surface ◽  
Hydrophilic Surface ◽  
Ar Plasma ◽  
Oxide Group

Fe3Si films are deposited onto the Si(111) wafer using sputtering with parallel facing targets. Surface modification of the deposited Fe3Si film is conducted by using a microwave plasma treatment under an Ar atmosphere at different powers of 50, 100 and, 150 W. After the Ar plasma treatment, the crystallinity of the coated Fe3Si films is enhanced, in which the orientation peaks, including (220), (222), (400), and (422) of the Fe3Si are sharpened. The extinction rule suggests that the B2–Fe3Si crystallites are the film’s dominant composition. The stoichiometry of the Fe3Si surfaces is marginally changed after the treatment. An increase in microwave power damages the surface of the Fe3Si films, resulting in the generation of small pinholes. The roughness of the Fe3Si films after being treated at 150 W is insignificantly increased compared to the untreated films. The untreated Fe3Si films have a hydrophobic surface with an average contact angle of 101.70°. After treatment at 150 W, it turns into a hydrophilic surface with an average contact angle of 67.05° because of the reduction in the hydrophobic carbon group and the increase in the hydrophilic oxide group. The hardness of the untreated Fe3Si is ~9.39 GPa, which is kept at a similar level throughout each treatment power.

Osteoconductivity of Superhydrophilic Ti- and Zr-Alloy for Biomedical Application

2016 ◽  
Vol 879 ◽  
pp. 2524-2527
Author(s):  
Masazumi Okido ◽  
Kensuke Kuroda
Keyword(s):  
Contact Angle ◽  
Water Contact Angle ◽  
Strong Influence ◽  
Biomedical Application ◽  
Hydrophobic Surface ◽  
Hydrophilic Surface ◽  
Water Contact ◽  
Zr Alloy ◽  
Zr Alloys

Surface hydrophilicity is considered to have a strong influence on the biological reactions of bone-substituting materials. However, the influence of a hydrophilic or hydrophobic surface on the osteoconductivity is not completely clear. In this study, we produced super-hydrophilic and hydrophobic surface on Ti-and Zr-alloys. Hydrothermal treatment at 180 oC for 180 min. in the distilled water and immersion in x5 PBS(-) brought the super-hydrophilic surface (water contact angle < 10 (deg.)) and heat treatment of as-hydrothermaled the hydrophobic surface. The osteoconductivity of the surface treated samples with several water contact angle was evaluated by in vivo testing. The surface properties, especially water contact angle, strongly affected the osteoconductivity and protein adsorbability, and not the surface substance.

Enhanced Wettability of Nanocrystalline Diamond Films for Biocoating Applications

2012 ◽  
Vol 1395 ◽  
Author(s):  
Jason H. C. Yang ◽  
Kungen Teii
Keyword(s):  
Contact Angle ◽  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Microwave Plasma ◽  
Hydrogen Plasma ◽  
Film Surface ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Polar Component ◽  
Oxygen Plasma Treatment

ABSTRACTNanocrystalline diamond (NCD) films are prepared from Ar-rich/N2/CH4 and Ar-rich/H2/CH4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately to enhance the wetting property. The hydrogen plasma treatment has small effect on the surface roughness, while the oxygen plasma treatment forms fine protrusions on the film surface. Results show that the wettability of the hydrogen plasma treated NCD film is nearly constant or little improvement as the polar component of the apparent surface free energy is close to the as-deposit NCD film. In contrast, the wettability of the oxygen plasma treated NCD film is improved dramatically such that the contact angle is reduced from 92º and 4.7º to almost 0º for water and 1-bromonaphthalene, respectively, and the polar component increases significantly to 34 mJ/m2. The low contact angle suggests that the film is considerably a cell adhesive friendly surface, which is essential in maintaining multicellular structure, and thus making it a favorable wetting surface for biological and biomedical applications.

Surface Modification of Aramid Fiber III by the Atmospheric-Pressure Air Plasma Treatment

2017 ◽  
Vol 893 ◽  
pp. 318-322 ◽  
Author(s):  
Feng De Wang ◽  
Yong Lei Lv ◽  
Xu Wei ◽  
Guo Ling ◽  
Zhe Wen Han
Keyword(s):  
Contact Angle ◽  
Surface Modification ◽  
Plasma Treatment ◽  
Atmospheric Pressure ◽  
Adhesive Force ◽  
Aramid Fiber ◽  
Air Plasma ◽  
Pull Out ◽  
Air Plasma Treatment ◽  
Effect Of Surface

Aramid fiber III has been treated by plasma treatment on different atmosphere gas to enhance the adhesive force between Aramid fiber III and epoxy matrix. The results of contact angle and SEM indicate that the obvious corrosion appear in the surface of aramid fiber III after plasma treatment. The yarn pull-out method was used to evaluate the effect of surface modification. The contact angle of original aramid fiber III is 65.9 o, and after treated the contact angle is declined to 62.2 o. The evaluation results show the tensile strength and NOL ILSS of treated Aramid fiber III/epoxy composite increased by about 10%. In summary, the effect of plasma treatment is obvious and has potential industry application.

Effect of radical on defect and molecular structure of monolayer MoS2 by low temperature plasma treatment

2022 ◽  
Author(s):  
Shuya ASADA ◽  
Akihisa OGINO
Keyword(s):  
Molecular Structure ◽  
Low Temperature ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Microwave Plasma ◽  
Hydrogen Ions ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
X Ray ◽  
Ar Plasma

Abstract The aim of this study is to form the sulfur defects on monolayer molybdenum disulfide (MoS2) by low temperature microwave plasma treatment suppressing disturbance of molecular structure. CVD-grown and plasma treated multilayer MoS2 surface were analyzed to investigate the effects of H2 and Ar plasma treatment on sulfur defects and molecular structure. It was found that the disturbance of molecular structure was suppressed in the H2 plasma treatment compared to the Ar plasma treatment. Varying the incident ratio of hydrogen ions H+ and radicals H*, the influences of H2 plasma treatment with high and low H*/H+ ratio on monolayer MoS2 structure were discussed. As a result of X-ray photoelectron spectroscopy, Raman spectroscopy and photoluminescence analysis, sulfur defects increased with the increase in total amount of radical incident on MoS2. In addition, it is speculated that the etching with radical contributed to form sulfur defects suppressing the disturbance of molecular structure.

Hydrophilic surface modification of polyethylene by NO-plasma treatment

1990 ◽  
Vol 4 (1) ◽  
pp. 99-107 ◽  
Author(s):  
N. Inagaki ◽  
S. Tasaka ◽  
H. Kawai ◽  
Y. Kimura
Keyword(s):  
Surface Modification ◽  
Plasma Treatment ◽  
Hydrophilic Surface

SURFACE MODIFICATION OF PLASMA TREATMENT ON SiO2 LAYER WITH UNDERFILL

2007 ◽  
Vol 14 (04) ◽  
pp. 849-852 ◽  
Author(s):  
BO-IN NOH ◽  
SEUNG-BOO JUNG
Keyword(s):  
Contact Angle ◽  
Free Energy ◽  
Surface Modification ◽  
Plasma Treatment ◽  
Surface Free Energy ◽  
Treatment Condition ◽  
Operating Time ◽  
Polar Component ◽  
Gas Atmosphere ◽  
Substrate Surfaces

The plasma treatment on SiO 2 substrate surfaces increased the oxygen-containing functional groups or the polar component of the surface free energy and, the wetting characteristics of the underfills/ SiO 2. The plasma treatment condition which gave the smallest contact angle between the underfills and SiO 2 was an operating time of 60 sec under O 2 gas atmosphere and a power of 200 W.

scholarly journals Use of statistical design of experiments for surface modification of Kapton films by CF 4 O 2 microwave plasma treatment

2017 ◽  
Vol 420 ◽  
pp. 579-585 ◽  
Author(s):  
Andrea Grandoni ◽  
Giacomo Mannini ◽  
Antonella Glisenti ◽  
Antonella Manariti ◽  
Giancarlo Galli
Keyword(s):  
Surface Modification ◽  
Design Of Experiments ◽  
Plasma Treatment ◽  
Microwave Plasma ◽  
Statistical Design ◽  
Statistical Design Of Experiments
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