scholarly journals Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment

Polymers ◽  
2021 ◽  
Vol 13 (17) ◽  
pp. 2958
Author(s):  
Alba Martínez ◽  
Sandra González-Lana ◽  
Laura Asín ◽  
Jesús M. de la Fuente ◽  
Cees W. M. Bastiaansen ◽  
...  

Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The use of nanosecond pulsed light-based interference lithography strengthens the pattern resolution through the absence of vibrational line pattern distortions. Typically, a conventional photoembossing protocol consists of an exposure step at room temperature that is followed by a thermal development step at high temperature. In this work, we explore the possibility to perform the pulsed holographic exposure directly at the development temperature. The surface relief structures generated using this modified photoembossing protocol are compared with those generated using the conventional one. Importantly, the enhancement of surface relief height has been observed by exposing the samples directly at the development temperature, reaching approximately double relief heights when compared to samples obtained using the conventional protocol. Advantageously, the light dose needed to reach the optimum height and the amount of photoinitiator can be substantially reduced in this modified protocol, demonstrating it to be a more efficient process for surface relief generation in photopolymers. Kidney epithelial cell alignment studies on substrates with relief-height optimized structures generated using the two described protocols demonstrate improved cell alignment in samples generated with exposure directly at the development temperature, highlighting the relevance of the height enhancement reached by this method. Although cell alignment is well-known to be enhanced by increasing the relief height of the polymeric grating, our work demonstrates nano-second laser interference photoembossing as a powerful tool to easily prepare polymeric gratings with tunable topography in the range of interest for fundamental cell alignment studies.

2020 ◽  
Vol 9 (1-2) ◽  
pp. 41-52 ◽  
Author(s):  
Jan-Hendrik Klein-Wiele ◽  
Andreas Blumenstein ◽  
Peter Simon ◽  
Jürgen Ihlemann

AbstractThe fabrication of periodic surface patterns on various materials by ultrashort ultraviolet (UV) laser pulses is reviewed. Laser interference ablation using two or more coherent beams leads to deterministic, strictly periodic patterns. The generation of the interfering beams is accomplished by diffractive optical elements like gratings, grating systems or computer-generated holograms. The recombination of the diffracted beams is performed by optical imaging or diffractive beam management. Ultrashort UV pulses are especially suited for generating micron- to submicron-sized deterministic periodic patterns on metals and semiconductors.


2017 ◽  
Vol 6 (3-4) ◽  
Author(s):  
Andrés Fabián Lasagni

AbstractFabrication of two- and three-dimensional (2D and 3D) structures in the micro- and nano-range allows a new degree of freedom to the design of materials by tailoring desired material properties and, thus, obtaining a superior functionality. Such complex designs are only possible using novel fabrication techniques with high resolution, even in the nanoscale range. Starting from a simple concept, transferring the shape of an interference pattern directly to the surface of a material, laser interferometric processing methods have been continuously developed. These methods enable the fabrication of repetitive periodic arrays and microstructures by irradiation of the sample surface with coherent beams of light. This article describes the capabilities of laser interference lithographic methods for the treatment of both photoresists and solid materials. Theoretical calculations are used to calculate the intensity distributions of patterns that can be realized by changing the number of interfering laser beams, their polarization, intensity and phase. Finally, different processing systems and configurations are described and, thus, demonstrating the possibility for the fast and precise tailoring of material surface microstructures and topographies on industrial relevant scales as well as several application cases for both methods.


2013 ◽  
Vol 552 ◽  
pp. 262-267 ◽  
Author(s):  
Jia Xu ◽  
Zuo Bin Wang ◽  
Zhan Kun Weng ◽  
Zhi Ming Li ◽  
Xiao Juan Sun ◽  
...  

This paper presents a method of laser interference nanolithography for the formation of interference patterns on the resist using a fiber semiconductor laser with a wavelength of 405nm. In the method, surface pattern structures are fabricated through the control of the incident angles of two interfering beams, the exposure dose of laser radiation and the development time. The angle adjustment becomes more convenient and the influence of environmental variations on the system has been reduced due to the use of fiber optic components. In the work, a feature size of down to 63nm and a pattern period of 215nm were achieved. The experimental results have shown that the method can be used for low cost micro and nano fabrication of periodical surface patterns with the features of low cost, simplicity and flexibility.


Wear ◽  
2016 ◽  
Vol 368-369 ◽  
pp. 350-357 ◽  
Author(s):  
Andreas Rosenkranz ◽  
Joris C. Pangraz ◽  
Carsten Gachot ◽  
Frank Mücklich

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