Structure and Electrical Properties of Highly (100)-Oriented Ba(Zr0.05Ti0.95)O3 Films Prepared by Chemical Solution Deposition

A chemical solution deposition process for preparation of highly (100)-oriented Ba(Zr0.05Ti0.95)O3 films was developed. The orientation degree of Ba(Zr0.05Ti0.95)O3 thin films prepared by this process can reach up to 99.1%. The electrical properties of the (100)-oriented films prepared by this process have been studied. The Ba(Zr0.05Ti0.95)O3 films with a thickness of about 270 nm show a dielectric constant of ∼740 and a loss tangent of ∼3%. The remanent polarization (2Pr) and coercive field (2Ec) are 3.2 μC/cm2 and 34 kV/cm, respectively.

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Effect of Pb1.1(Al1/2Nb1/2)O3on Structure and Electrical Properties of Lead Titanate Thin Films Prepared by Chemical Solution Deposition Process

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.202 ◽

2002 ◽

Vol 41 (Part 1, No. 1) ◽

pp. 202-207 ◽

Cited By ~ 2

Author(s):

Bo-Ping Zhang ◽

Takashi Iijima ◽

Yohachi Yamashita

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Lead Titanate ◽

Chemical Solution Deposition ◽

Deposition Process ◽

Chemical Solution ◽

Solution Deposition

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Chemical Solution Deposition Process and Characterization of Li and Ti Doped NiO Thin Films

Materials Science Forum ◽

10.4028/www.scientific.net/msf.475-479.1595 ◽

2005 ◽

Vol 475-479 ◽

pp. 1595-1598 ◽

Cited By ~ 3

Author(s):

Bo Ping Zhang ◽

Jing Feng Li ◽

Li Min Zhang ◽

Jun Zeng ◽

Yan Dong

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Chemical Solution Deposition ◽

Low Frequency ◽

Deposition Process ◽

Titanium Isopropoxide ◽

Chemical Solution ◽

Solution Deposition ◽

Chemical Solution Deposition Method ◽

Co Doped

Lithium and titanium co-doped NiO ceramics have been found to exhibit a giant low-frequency dielectric constant (ε～105), however, the same system thin films is not yet study. In the present study, Lithium and titanium co-doped NiO thin films were prepared by a chemical solution deposition method using 2-methoxyethanol as a solvent, nickel actate tetrahydrate, lithium acetate dihydrate and titanium isopropoxide as starting materials. The complex oxides such as NiO, Ni0.2O0.8 and NiTiO3 were formed for the Ni0.98Ti0.02O and Ni0.686Li0.294Ti0.02O thin films, and the addition of the lithium lead to the formation of Li2NiO2.888. The dielectric constant of Lithium and titanium co-doped Ni0.686Li0.294Ti0.02O thin films is about 426 at 100 Hz and much higher than that of the titanium-doped Ni0.98Ti0.02O.

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Chemical Solution Deposition of La-Substituted BiFe0.5Sc0.5O3 Perovskite Thin Films on Different Substrates

Coatings ◽

10.3390/coatings11030307 ◽

2021 ◽

Vol 11 (3) ◽

pp. 307

Author(s):

Diana Griesiute ◽

Dovydas Karoblis ◽

Lina Mikoliunaite ◽

Aleksej Zarkov ◽

Andrei N. Salak ◽

...

Keyword(s):

Thin Films ◽

Chemical Solution Deposition ◽

Cost Effective ◽

Deposition Process ◽

Stability Study ◽

Fused Silica ◽

Chemical Solution ◽

Solution Deposition ◽

Optimal Annealing Temperature ◽

Xrd Patterns

In the present work, polycrystalline Bi0.67La0.33Fe0.5Sc0.5O3 thin films were synthesized using a simple and cost-effective chemical solution deposition process employing the spin coating technique. In order to check the feasibility of the fabrication of thin films on various types of substrates, the films were deposited on Pt-coated silicon, silicon, sapphire, corundum, fused silica and glass. Based on the results of thermogravimetric analysis of precursor and thermal stability study, it was determined that the optimal annealing temperature for the formation of perovskite structure is 600 °C. It was observed that the relative intensity of the pseudocubic peaks (001)p and (011)p in the XRD patterns is influenced by the nature of substrates, suggesting that the formed crystallites have some preferred orientation. Roughness of the films was determined to be dependent on the nature of the substrate.

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Enhanced electrical conductivity of Au–LaNiO3 nanocomposite thin films by chemical solution deposition

RSC Advances ◽

10.1039/c5ra15152j ◽

2015 ◽

Vol 5 (94) ◽

pp. 76783-76787 ◽

Cited By ~ 10

Author(s):

H. L. Wang ◽

X. K. Ning ◽

Z. J. Wang

Keyword(s):

Thin Films ◽

Electrical Conductivity ◽

Electrical Properties ◽

Chemical Solution Deposition ◽

Nanocomposite Films ◽

Chemical Solution ◽

Solution Deposition ◽

Nanocomposite Thin Films ◽

One Step

Au–LaNiO3 (Au–LNO) nanocomposite films with 3.84 at% Au were firstly fabricated by one-step chemical solution deposition (CSD), and their electrical properties were investigated.

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