ROLE OF SILICON CARBIDE CONTENT IN SOME ZONES OF WORKING SPACE OF FURNACES FOR SMELTING SILICON AND HIGH-SILICON FERROALLOYS

Metallurg ◽  
2021 ◽  
pp. 23-28
Author(s):  
A.V. Sivtsov ◽  
K.S. Yolkin ◽  
D.K. Yolkin ◽  
A.I. Karlina
1970 ◽  
Vol 3 (8) ◽  
pp. 1284-1289 ◽  
Author(s):  
M J Zarabi ◽  
M Satyam
Keyword(s):  

2001 ◽  
Author(s):  
Peter V. Rybin ◽  
Dmitri V. Kulikov ◽  
Yuri V. Trushin ◽  
J. Petzoldt

Carbon ◽  
2020 ◽  
Vol 158 ◽  
pp. 110-120
Author(s):  
Junsung Hong ◽  
Youngjin Ko ◽  
Kwang-Yeon Cho ◽  
Dong-Geun Shin ◽  
Prabhakar Singh ◽  
...  

2018 ◽  
Vol 924 ◽  
pp. 339-344 ◽  
Author(s):  
Fabrizio Roccaforte ◽  
Marilena Vivona ◽  
Giuseppe Greco ◽  
Raffaella Lo Nigro ◽  
Filippo Giannazzo ◽  
...  

The physics and technology of metal/semiconductor interfaces are key-points in the development of silicon carbide (SiC) based devices. Although in the last decade, the metal to 4H-SiC contacts, either Ohmic or Schottky type, have been extensively investigated with important achievements, these remain even now an intriguing topic since metal contacts are fundamental bricks of all electronic devices. Hence, their comprehension is at the base of the improvement of the performances of simple devices and complex systems. In this context, this paper aims to highlight some relevant aspects related to metal/semiconductor contacts to SiC, both on n-type and p-type, with an emphasis on the role of the barrier and on the carrier transport mechanisms at the interfaces.


2020 ◽  
Vol 46 (16) ◽  
pp. 25921-25926 ◽  
Author(s):  
S. Velappan ◽  
P. Nivedhita ◽  
R. Vimala ◽  
Sellappan Raja

Open Ceramics ◽  
2020 ◽  
Vol 2 ◽  
pp. 100018
Author(s):  
T.S.R.C. Murthy ◽  
Lucas Reeman ◽  
Ji Zou ◽  
Vinothini Venkatachalam ◽  
Ben Baker ◽  
...  

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