Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography
Katia Vutova
◽
Elena Koleva
◽
Georgy Mladenov
Katia Vutova
◽
Georgi Mladenov
2006 ◽
Vol 77
(3)
◽
pp. 03C111
◽
Sadao Momota
◽
Shingo Iwamitsu
◽
Shougo Goto
◽
Yoichi Nojiri
◽
Jun Taniguchi
◽
...
2021 ◽
Vol 31
(5)
◽
pp. 1-4
Jay C. LeFebvre
◽
Shane A. Cybart
1987 ◽
Vol 5
(1)
◽
pp. 232
◽
1998 ◽
Vol 16
(4)
◽
pp. 2484
◽
2012 ◽
Vol 272
◽
pp. 149-152
◽
Nitipon Puttaraksa
◽
Somrit Unai
◽
Michael W. Rhodes
◽
Kanda Singkarat
◽
Harry J. Whitlow
◽
...
1999 ◽
Vol 46
(1-4)
◽
pp. 469-472
◽
Y. Lee
◽
R.A. Gough
◽
T.J. King
◽
Q. Ji
◽
K.N. Leung
◽
...
1987 ◽
Vol 15
(6)
◽
pp. 678-685
◽
V. M. Bystritskii
◽
Ya. E. Krasik
◽
A. A. Sinebryukhov
1989 ◽
Vol 9
(1-4)
◽
pp. 277-279
◽
Takao Shiokawa
◽
Pil Hyon Kim
◽
Manabu Hamagaki
◽
Tamio Hara
◽
Yoshinobu Aoyagi
◽
...
2007 ◽
Vol 261
(1-2)
◽
pp. 731-735
◽
Bibhudutta Rout
◽
Alexander D. Dymnikov
◽
Daniel P. Zachry
◽
Elia V. Eschenazi
◽
Yongqiang Q. Wang
◽
...
Close
Export Citation Format
Close
Share Document
Close