Development of Energy-Efficient Superhydrophobic Polypropylene Fabric by Oxygen Plasma Etching and Thermal Aging

This study developed a human-friendly energy-efficient superhydrophobic polypropylene (PP) fabric by oxygen plasma etching and short-term thermal aging without additional chemicals. The effect of the microroughness on the superhydrophobicity was examined by adjusting the weave density. After the PP fabric was treated with oxygen plasma etching for 15 min and thermal aging at 120 °C for 1 h (E15H120 1 h), the static contact and shedding angles were 162.7° ± 2.4° and 5.2° ± 0.7° and the energy consumption was 136.4 ± 7.0 Wh. Oxygen plasma etching for 15 min and thermal aging at 120 °C for 24 h (E15H120 24 h) resulted in a static contact and shedding angle of 180.0° ± 0.0° and 1.8° ± 0.2° and energy consumption of 3628.5 ± 82.6 Wh. E15H120 1 h showed a lower shedding angle but had a higher sliding angle of 90°. E15H120 24 h exhibited shedding and sliding angles of less than 10°. Regardless of the thermal aging time, superhydrophobicity was higher in high-density fabrics than in low-density fabrics. The superhydrophobic PP fabric had a similar water vapor transmission rate and air permeability with the untreated PP fabric, and it showed a self-heading property after washing followed by tumble drying and hot pressing.

Nanosphere Lithography for Structuring Polycrystalline Diamond Films

This paper deals with the structuring of polycrystalline diamond thin films using the technique of nanosphere lithography. The presented multistep approaches relied on a spin-coated self-assembled monolayer of polystyrene spheres, which served as a lithographic mask for the further custom nanofabrication steps. Various arrays of diamond nanostructures—close-packed and non-close-packed monolayers over substrates with various levels of surface roughness, noble metal films over nanosphere arrays, ordered arrays of holes, and unordered pores—were created using reactive ion etching, chemical vapour deposition, metallization, and/or lift-off processes. The size and shape of the lithographic mask was altered using oxygen plasma etching. The periodicity of the final structure was defined by the initial diameter of the spheres. The surface morphology of the samples was characterized using scanning electron microscopy. The advantages and limitations of the fabrication technique are discussed. Finally, the potential applications (e.g., photonics, plasmonics) of the obtained nanostructures are reviewed.

Краевое легирование в графеновых приборах на подложках SiO-=SUB=-2-=/SUB=-

The conductivity of single layer and bilayer graphene ribbons 0.5–4 μm in width fabricated by oxygen plasma etching is studied experimentally. The dependence of the electron concentration in graphene on the ribbon width is revealed. This effect is explained by the edge doping of graphene due to defects arranged in SiO_2 near the ribbon edges. The method of the formation of abrupt p – n junctions in graphene and structures with a constant electron concentration gradient in the graphene plane with the help of edge doping is proposed.