A Novel Approach to the Facile Growth and Organization of Photothermal Prussian Blue Nanocrystals on Different Surfaces

We report here a novel “one-pot” approach for the controlled growth and organization of Prussian blue nanostructures on three different surfaces: pure Au0, cysteamine-functionalized Au0, and SiO2-supported lipid bilayers with different natures of lipids. We demonstrate that fine control over the size, morphology, and the degree and homogeneity of the surface coverage by Prussian Blue (PB) nanostructures may be achieved by manipulating different parameters, which are the precursor concentration, the nature of the functional groups or the nature of lipids on the surfaces. This allows the growth of isolated PB nanopyramids and nanocubes or the design of thin dense films over centimeter square surfaces. The formation of unusual Prussian blue nanopyramids is discussed. Finally, we demonstrate, by using experimental techniques and theoretical modeling, that PB nanoparticles deposited on the gold surface exhibit strong photothermal properties, permitting a rapid temperature increase up to 90 °C with a conversion of the laser power of almost 50% for power source heat.

Laser-Induced Thermal Stresses in Dense and Porous Silicon Dioxide Films

The laser-induced thermal stresses in silicon dioxide films are calculated using molecular dynamics simulations. The absorption of the laser energy is simulated by the linear temperature growth from room temperature to 1300 K in a time equal to the laser pulse duration. The maximum values of stresses for picosecond pulses are approximately twice as high as for nanosecond pulses. The stresses in highly porous glancing angle deposited films are approximately two times lower than in dense films. Stress waves caused by picosecond pulses are observed in dense films. An increase in the heating temperature to 1700 K leads to an increase in the absolute stress values for picosecond pulses, and a decrease for nanosecond pulses.

Two-Step Deposition of Silicon Oxide Films Using the Gas Phase Generation of Nanoparticles in the Chemical Vapor Deposition Process

Non-classical crystallization, in which charged nanoparticles (NPs) are the building blocks of film growth, has been extensively studied in chemical vapor deposition (CVD). Here, the deposition behavior of silicon oxide films by the two-step growth process, where NPs are generated in the gas phase at high temperature and deposited as films at low temperature, was studied in the CVD process. Although we supplied SiH4, H2, and N2, the deposited film turned out to be silicon oxide, which is attributed to relatively poor vacuum. Also, silicon oxide NPs were captured on transmission electron microscopy (TEM) carbon membranes of a copper grid for 10 s under various conditions. When the quartz tube with a conical nozzle was used, the size of nanoparticles increased drastically with increasing processing time (or delay time) and porous films with a rough surface were deposited. When the quartz tube without a nozzle was used, however, the size did not increase much with increasing processing time and dense films with a smooth surface were deposited. These results suggest that the size of nanoparticles is an important parameter for the deposition of dense films for two-step growth at low temperatures.

Selection of synthesis parameters for niobium pentaoxide films by oxidation in phosphoric acid solution.

The possibilities of synthesis of niobium pentoxide films by anodic oxidation were studied. The process parameters leading to the formation of coherent dense films were determined. Itwas shown that films with the thickness of 30 up to 400 nm can be obtained during the first 15 minutes of the process by varying the voltage.

Tailoring the Thermal and Mechanical Properties of PolyActiveTM Poly(Ether-Ester) Multiblock Copolymers Via Blending with CO2-Phylic Ionic Liquid

The last decade has seen an exponential increase in the number of studies focused on novel applications for ionic liquids (ILs). Blends of polymers with ILs have been proposed for use in fuel cells, batteries, gas separation membranes, packaging, etc., each requiring a set of specific physico-chemical properties. In this work, blends of four grades of the poly(ether-ester) multiblock copolymer PolyActive™ with different concentrations of the CO2-philic 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide [BMIM][Tf2N] were prepared in the form of dense films by a solution casting and solvent evaporation method, in view of their potential use as gas separation membranes for CO2 capture. Depending on the polymer structure, the material properties could be tailored over a wide range by means of the IL content. All samples were dry-feeling, highly elastic self-standing dense films. The microstructure of the blends was studied by scanning electron microscopy with a backscattering detector, able to observe anisotropy in the sample, while a special topographic analysis mode allowed the visualization of surface roughness. Samples with the longest poly(ethylene oxide terephthalate) (PEOT) blocks were significantly more anisotropic than those with shorter blocks, and this heterogeneity increased with increasing IL content. DSC analysis revealed a significant decrease in the melting enthalpy and melting temperature of the crystalline PEOT domains with increasing IL content, forming an amorphous phase with Tg ≈ −50 °C, whereas the polybutylene terephthalate (PBT) phase was hardly affected. This indicates better compatibility of the IL with the polyether phase than the polyester phase. Young’s modulus was highest and most IL-dependent for the sample with the highest PEOT content and PEOT block length, due to its high crystallinity. Similarly, the sample with short PEOT blocks and high PBT content also showed a high modulus and tensile strength, but much lower maximum elongation. This study provides a detailed discussion on the correlation between the morphological, thermal, and mechanical properties of these PolyActive™/[BMIM][Tf2N] blends.

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films

MoO3 films were deposited by RF magnetron sputtering technique on glass and silicon substrates held at 473 K by sputtering of metallic molybdenum target at an oxygen partial pressure of 4 × 10−2 Pa and at different sputtering pressures in the range of 2 Pa to 6 Pa. The influence of sputtering pressure on the structure and surface morphology, electrical and optical properties of the MoO3 thin films was studied. X-ray diffraction studies suggest that the films deposited at a sputtering pressure of 2 Pa were polycrystalline in nature with mixed phase of α- and β-phase MoO3, while those formed at sputtering pressure of 4 Pa and above were of α-phase MoO3. Scanning electron micrographs showed a decrement in the size of the particles and their shapes changed from needle like structure to dense films with the increase of sputtering pressure. Fourier transform infrared spectroscopic studies confirmed the presence of characteristic vibration modes of Mo=O, Mo–O and Mo–O–Mo related to MoO3. Electrical resistivity of the MoO3 films decreased from 6.0 × 104 Ω cm to 2 × 104 Ω cm with an increase of sputtering pressure from 2 Pa to 6 Pa, respectively. Optical band gap of the films decreased from 3.12 eV to 2.86 eV with the increase of sputtering pressure from 2 Pa to 6 Pa, respectively.

Studies on the Characteristics and the Effect of Thickness on the Band Gap Energies of Al2O3 Thin Films Prepared by PLD

Pulsed laser deposition (PLD) method has the advantages of high quality mirror finish, good densification and uniform thickness. In this work, Al2O3 thin films with different thicknesses were fabricated via the PLD method. The characteristics of the thin film samples were investigated using Grazing Incidence Diffraction (GID) technique and Field Emission Scanning Electron Microscope (FESEM). For the band gap studies, measurements were done using a UV-Vis NIR spectrophotometer. The deposition was done in the presence of oxygen gas with partial pressure of 2.66 Pa. FESEM images showed high quality, smooth and dense films obtained using the PLD method. The Al2O3 thin films have thicknesses of between 71.2 nm to 176 nm. The band gap energies obtained were in the range of 6.29 eV to 6.49 eV. It was observed that the band gap of the thin films increases as the thickness decreases due to the defects in the films.

Processes connected with local laser heating of TiB2 armor ceramics

The process of high-temperature heating of TiB2 armor ceramics in air in a continuous and pulsed mode of laser irradiation has been studied by the X-ray diffraction and SEM methods. It has been established that, in the irradiation zone, the temperature increases up to 3000 ?C and over, resulting in the decomposition of TiB2 and appearance of ablation products, which, in passage of air, oxidize and form dense films (in the pulsed mode) or ?reticulated? films (in the CW mode) consisting of boron and titanium oxides. The mechanism of laser-induced breakdown of TiB2 ceramics is similar to the mechanism of ballistic destruction.