Ion Beam Modification of Materials
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A mewa ion source for simultaneous implantation of gas and metal ions

1996 ◽  
pp. 651-656
Author(s):  
B.H. Wolf ◽  
H. Emig ◽  
D.M. Rück ◽  
P. Spädtke ◽  
E. Oks
Keyword(s):  
Metal Ions ◽  
Ion Source

Transient Analysis of Semiconductor Devices Using an MeV Ion Microprobe.

1996 ◽  
pp. 1114-1117
Author(s):  
J.S. Laird ◽  
R.A. Bardos ◽  
G.R. Moloney ◽  
A. Saint ◽  
G.J.F. Legge
Keyword(s):  
Transient Analysis ◽  
Semiconductor Devices ◽  
Ion Microprobe

Role of ion implantation on the storage and dissipation of polarisation energy in alumina

1996 ◽  
pp. 1069-1072 ◽  
Author(s):  
J. Bigarré ◽  
S. Fayeulle ◽  
D. Tréheux ◽  
K.H. Oh ◽  
C. Le Gressus
Keyword(s):  
Ion Implantation

Characterization of a Hafnium and Nitrogen Implanted Titanium Alloy

1996 ◽  
pp. 1016-1019 ◽  
Author(s):  
D.M. Rück ◽  
H. Schmidt ◽  
N. Angert ◽  
O. Yoda ◽  
Y. Aoki ◽  
...  
Keyword(s):  
Titanium Alloy
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