Ion Implantation: Equipment and Techniques
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Published By Springer Berlin Heidelberg

9783642691584, 9783642691560

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Pulse-Laser-Induced Epitaxial Regrowth of Ion-Implanted Semiconductors

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_57 ◽

1983 ◽

pp. 504-512 ◽

Author(s):

C. Götz ◽

W. Andrä ◽

H.-D. Geiler ◽

M. Wagner

Keyword(s):

Pulse Laser ◽

Epitaxial Regrowth ◽

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Beam Annealing of Ion-Implanted Silicon

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_55 ◽

1983 ◽

pp. 482-497 ◽

Author(s):

J. F. Gibbons

Keyword(s):

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Doping Behavior of Implanted Magnesium in Silicon

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_54 ◽

1983 ◽

pp. 473-480 ◽

Author(s):

H. Sigmund ◽

D. Weiß

Keyword(s):

Doping Behavior

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Methods to Control Target Heating During Ion Implantation

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_43 ◽

1983 ◽

pp. 364-373 ◽

Author(s):

K. S. Grabowski ◽

R. A. Kant

Keyword(s):

Ion Implantation ◽

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Effect of Ion Mixing on the Wear Behaviour of Silver

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_42 ◽

1983 ◽

pp. 357-363

Author(s):

L. Calliari ◽

L. Guzman ◽

S. Russo ◽

C. Tosello ◽

G. Wolf ◽

...

Keyword(s):

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A Mössbauer Spectrometer for in situ Low Temperature Studies of Ion-Bombarded Metals

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_37 ◽

1983 ◽

pp. 313-317

Author(s):

G. K. Wolf ◽

F. Schreyer ◽

G. Frech ◽

F. Wagner

Keyword(s):

Low Temperature ◽

Mössbauer Spectrometer

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Dosimetry and Beam Quality

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_33 ◽

1983 ◽

pp. 274-290 ◽

Author(s):

G. Ryding

Keyword(s):

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A Rotating Attenuator for Concentration Profiling of Implanted Helium Ions

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_28 ◽

1983 ◽

pp. 233-239

Author(s):

J. H. Chang ◽

W. J. Choyke ◽

N. J. Doyle

Keyword(s):

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Electron-Beam-Induced Recoil Implantation in Semiconductors at 300 K

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_26 ◽

1983 ◽

pp. 214-220 ◽

Author(s):

T. Wada ◽

K. Nakai ◽

H. Hada

Keyword(s):

Electron Beam ◽

Recoil Implantation

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Wafer Cooling and Photoresist Masking Problems in Ion Implantation

Ion Implantation: Equipment and Techniques ◽

10.1007/978-3-642-69156-0_25 ◽

1983 ◽

pp. 196-213 ◽

Author(s):

T. C. Smith

Keyword(s):

Ion Implantation

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