2006 International Workshop on Junction Technology
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148
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Published By IEEE

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Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

45nm Node p+ USJ Formation With High Dopant Activation And Low Damage

2006 ◽  
Author(s):  
J. Borland ◽  
S. Shishiguchi ◽  
A. Mineji ◽  
W. Krull ◽  
D. Jacobson ◽  
...  
Keyword(s):  
Dopant Activation

Self-Organized

2006 ◽  
Author(s):  
N. Mise ◽  
Y. Watanabe ◽  
S. Migita ◽  
T. Nabatame ◽  
H. Satake ◽  
...  
Keyword(s):  
Self Organized

Direct Observation of 2-D Dopant Profiles of MOSFETs Activated by Millisecond Anneal

2006 ◽  
Author(s):  
K. Adachi ◽  
K. Ohuchi ◽  
N. Aoki ◽  
H. Tanimoto ◽  
H. Tsujii ◽  
...  
Keyword(s):  
Direct Observation ◽  
Dopant Profiles
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