The 1998 international conference on characterization and metrology for ULSI technology
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Trends in nondestructive imaging of IC packages

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56915 ◽

1998 ◽

Author(s):

T. M. Moore ◽

C. D. Hartfield

Keyword(s):

Nondestructive Imaging

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Grain orientation mapping of passivated aluminum interconnect lines by x-ray micro-diffraction

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56826 ◽

1998 ◽

Author(s):

C. H. Chang ◽

A. A. MacDowell ◽

A. C. Thompson ◽

H. A. Padmore ◽

J. R. Patel

Keyword(s):

Grain Orientation ◽

X Ray ◽

Orientation Mapping ◽

Interconnect Lines

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A survey of advanced excimer optical imaging and lithography

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56910 ◽

1998 ◽

Author(s):

Koichi Matsumoto ◽

Kyoichi Suwa

Keyword(s):

Optical Imaging

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Metrology of image placement

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56839 ◽

1998 ◽

Author(s):

Alexander Starikov

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Effect of technology scaling on MOS electrical characterization

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56822 ◽

1998 ◽

Author(s):

Mohsen Alavi ◽

Rafael Rios

Keyword(s):

Electrical Characterization ◽

Technology Scaling

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Transmission electron microscopy: A critical analytical tool for ULSI technology

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56853 ◽

1998 ◽

Author(s):

David Venables ◽

David W. Susnitzky ◽

A. John Mardinly

Keyword(s):

Electron Microscopy ◽

Transmission Electron Microscopy ◽

Analytical Tool ◽

Transmission Electron

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Infrared spectroscopy for process control and fault detection of advanced semiconductor processes

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56898 ◽

1998 ◽

Author(s):

P. Rosenthal ◽

W. Aarts ◽

A. Bonanno ◽

D. Boning ◽

S. Charpenay ◽

...

Keyword(s):

Infrared Spectroscopy ◽

Fault Detection ◽

Process Control

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Metrology issues for processing of 300 mm wafers

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56791 ◽

1998 ◽

Author(s):

Kenji Watanabe ◽

Atsuyoshi Koike

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Metrology aspects of SIMS depth profiling for advanced ULSI processes

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56792 ◽

1998 ◽

Author(s):

Andre Budrevich ◽

Jerry Hunter

Keyword(s):

Depth Profiling ◽

Sims Depth Profiling

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Novel metrology for the DUV photolithography sequence

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56842 ◽

1998 ◽

Author(s):

Nickhil Jakatdar ◽

Xinhui Niu ◽

Haolin Zhang ◽

Junwei Bao ◽

Costas Spanos

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