Extreme Ultraviolet (EUV) Lithography X
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9781510625617, 9781510625624
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Analysis of line-and-space patterns of ZrO2 nanoparticle resist on the basis of EUV sensitization mechanism

2019 ◽  
Author(s):  
Takahiro Kozawa ◽  
Teppei Yamada ◽  
Ayako Nakajima ◽  
Yusa Muroya ◽  
Julius J. Santillan ◽  
...  

Actinic metrology platform for defect review and mask qualification: flexibility and performance

2019 ◽  
Author(s):  
Renzo Capelli ◽  
Martin Dietzel ◽  
Dirk Hellweg ◽  
Markus Koch ◽  
Grizelda Kersteen ◽  
...  
Keyword(s):  
And Performance

High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing

2019 ◽  
Author(s):  
Hakaru Mizoguchi ◽  
Hiroaki Nakarai ◽  
Tamotsu Abe ◽  
Yasufumi Kawasuji ◽  
Hiroshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
High Volume

Interferometric measurement of phase in EUV masks

2019 ◽  
Author(s):  
Wenhua Zhu ◽  
Ryan Miyakawa ◽  
Lei Chen ◽  
Patrick Naulleau
Keyword(s):  
Interferometric Measurement

Litho-performance expansion with new SOC made from Hemicellulose

2019 ◽  
Author(s):  
Masahiko Harumoto ◽  
Yuji Tanaka ◽  
Chisayo Nakayama ◽  
Yo Arisawa ◽  
Masaya Asai ◽  
...  

Electrically measurable test structures to capture and classify EUV stochastics

2019 ◽  
Author(s):  
Hemant Vats ◽  
Ryan Ryoung Han Kim ◽  
Yasser Sherazi ◽  
Youssef Drissi ◽  
Kurt Ronse

Fundamental study on dissolution kinetics of poly(4-hydroxystyrene) for development of high-resolution resists

2019 ◽  
Author(s):  
Ayako Nakajima ◽  
Kyoko Watanabe ◽  
Kyoko Matsuoka ◽  
Takahiro Kozawa ◽  
Yoshitaka Komuro ◽  
...  
Keyword(s):  
High Resolution ◽  
Dissolution Kinetics ◽  
Fundamental Study ◽  
Kinetics Of
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