Mesoporous Ordered Silica Films

2022 ◽  
Author(s):  
Plinio Innocenzi
Keyword(s):  
Silica Films

New Structure of CTAB Templated Silica Films as revealed by GISAXS coupled to HRTEM

2000 ◽  
Vol 628 ◽  
Author(s):  
Sophie Besson ◽  
Catherine Jacquiod ◽  
Thierry Gacoin ◽  
André Naudon ◽  
Christian Ricolleau ◽  
...  
Keyword(s):  
Cetyltrimethylammonium Bromide ◽  
Grazing Incidence ◽  
Hexagonal Structure ◽  
X Ray Diffraction ◽  
Electronic Microscopy ◽  
Silica Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Hexagonal Arrangement ◽  
Spherical Micelles

ABSTRACTA microstructural study on surfactant templated silica films is performed by coupling traditional X-Ray Diffraction (XRD) and Transmission Electronic Microscopy (TEM) to Grazing Incidence Small Angle X-Ray Scattering (GISAXS). By this method it is shown that spin-coating of silicate solutions with cationic surfactant cetyltrimethylammonium bromide (CTAB) as a templating agent provides 3D hexagonal structure (space group P63/mmc) that is no longer compatible with the often described hexagonal arrangement of tubular micelles but rather with an hexagonal arrangement of spherical micelles. The extent of the hexagonal ordering and the texture can be optimized in films by varying the composition of the solution.

Design of oriented mesoporous silica films for guiding protein adsorption states

2021 ◽  
Author(s):  
Yadong Chai ◽  
Yuri Maruko ◽  
Zizhen Liu ◽  
Motohiro Tagaya
Keyword(s):  
Mesoporous Silica ◽  
Protein Adsorption ◽  
Silica Films

The highly-oriented cylindrical mesoporous silica films were synthesized on the rubbing-treated polyimide, and effectively adsorbed the mesoscale biomolecules such as proteins and guided to be their anisotropic adsorption shapes.

scholarly journals Effects of morphology and pore size of mesoporous silicas on the efficiency of an immobilized enzyme

RSC Advances ◽  
2021 ◽  
Vol 11 (17) ◽  
pp. 10010-10017
Author(s):  
Ping-Chung Kuo ◽  
Zhi-Xun Lin ◽  
Tzi-Yi Wu ◽  
Chun-Han Hsu ◽  
Hong-Ping Lin ◽  
...  
Keyword(s):  
Enzyme Activity ◽  
Mesoporous Silica ◽  
Pore Size ◽  
Immobilized Enzyme ◽  
Mesoporous Silicas ◽  
High Loading ◽  
Loading Capacity ◽  
Silica Films

Mesoporous silica films were used as supports with high loading capacity and enzyme activity.

scholarly journals Silica Layer Used in Sensor Fabrication from a Low-Temperature Silane-Free Procedure

Chemosensors ◽  
2021 ◽  
Vol 9 (2) ◽  
pp. 32
Author(s):  
Pei-Cheng Jiang ◽  
Yu-Ting Chow ◽  
Chi-Wei Chien ◽  
Cheng-Hsun-Tony Chang ◽  
Chii-Ruey Lin
Keyword(s):  
Room Temperature ◽  
Chemical Vapor ◽  
Industrial Safety ◽  
Silica Layer ◽  
Silica Films ◽  
Sensor Fabrication ◽  
Vapor Deposition Technique ◽  
Safety Design ◽  
Biogenic Polyamines ◽  
Si Wafer

Silica (SiO2, silicon dioxide—a dielectric layer commonly used in electronic devices) is widely used in many types of sensors, such as gas, molecular, and biogenic polyamines. To form silica films, core shell or an encapsulated layer, silane has been used as a precursor in recent decades. However, there are many hazards caused by using silane, such as its being extremely flammable, the explosive air, and skin and eye pain. To avoid these hazards, it is necessary to spend many resources on industrial safety design. Thus, the silica synthesized without silane gas which can be determined as a silane-free procedure presents a clean and safe solution to manufactures. In this report, we used the radio frequency (rf = 13.56 MHz) plasma-enhanced chemical vapor deposition technique (PECVD) to form a silica layer at room temperature. The silica layer is formed in hydrogen-based plasma at room temperature and silane gas is not used in this process. The substrate temperature dominates the silica formation, but the distance between the substrate and electrode (DSTE) and the methane additive can enhance the formation of a silica layer on the Si wafer. This silane-free procedure, at room temperature, is not only safer and friendlier to the environment but is also useful in the fabrication of many types of sensors.

Free-standing large-mesoporous silica films decorated with lanthanum as new adsorbents for efficient removal of phosphate

2019 ◽  
Vol 296 ◽  
pp. 111815 ◽  
Author(s):  
Xuan Jing ◽  
Yaxin Wang ◽  
Li Chen ◽  
Yunyun Wang ◽  
Xinyan Yang ◽  
...  
Keyword(s):  
Mesoporous Silica ◽  
Efficient Removal ◽  
Free Standing ◽  
Silica Films

Comparative Studies of Ultra Low-κ Porous Silica Films with 2-D Hexagonal and Disordered Pore Structures

2004 ◽  
Vol 812 ◽  
Author(s):  
Nobutoshi Fujii ◽  
Kazuhiro Yamada ◽  
Yoshiaki Oku ◽  
Nobuhiro Hata ◽  
Yutaka Seino ◽  
...  
Keyword(s):  
Pore Structure ◽  
Nonionic Surfactants ◽  
Porous Silica ◽  
Silica Film ◽  
X Ray Diffraction ◽  
Silica Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Porous Silica Film ◽  
Diffraction Peaks

AbstractPeriodic 2-dimensional (2-D) hexagonal and the disordered pore structure silica films have been developed using nonionic surfactants as the templates. The pore structure was controlled by the static electrical interaction between the micelle of the surfactant and the silica oligomer. No X-ray diffraction peaks were observed for the disordered mesoporous silica films, while the pore diameters of 2.0-4.0 nm could be measured by small angle X-ray scattering spectroscopy. By comparing the properties of the 2-D hexagonal and the disordered porous silica films which have the same porosity, it is found that the disordered porous silica film has advantages in terms of the dielectric constant and Young's modulus as well as the hardness. The disordered porous silica film is more suitable for the interlayer dielectrics for ULSI.

The Preparation and Properties of Silica Films Deposited from Silane and Carbon Dioxide

1969 ◽  
Vol 116 (7) ◽  
pp. 1014 ◽  
Author(s):  
R. C. G. Swann ◽  
A. E. Pyne
Keyword(s):  
Carbon Dioxide ◽  
Silica Films

Carbon Dioxide Mediated Synthesis of Mesoporous Silica Films: Tuning Properties using Pressure

2008 ◽  
Vol 20 (9) ◽  
pp. 3229-3238 ◽  
Author(s):  
Xinxin Li ◽  
Bryan D. Vogt
Keyword(s):  
Carbon Dioxide ◽  
Mesoporous Silica ◽  
Silica Films

Nanostructured Doped Silica Films Application as Sensitive Layers for Chemical Sensors

2013 ◽  
Vol 684 ◽  
pp. 7-11
Author(s):  
Sergey Krutovertsev ◽  
Alla Tarasova ◽  
Olga Ivanova ◽  
Larisa Krutovertseva
Keyword(s):  
Initial Conditions ◽  
Sol Gel ◽  
Silica Films ◽  
Adsorption Activity ◽  
Developed Surface ◽  
Sol Gel Process ◽  
Sensitive Characteristics ◽  
The Right ◽  
Kinetics Of ◽  
Matrix Factors

The sensor behavior of nanostructured doped silica films produced by sol-gel way were examined. Hygroscopic substances and polyoxometalates were used as additives to make more significant sensitive characteristics of initial matrix. Factors that have effect on sol preparation and films forming were investigated. Adsorption activity of the sensitive films was studied and it was shown that the films had a highly developed surface with nano-size pores. Change of initial conditions of sol-gel process gives opportunity to influence on kinetics of gel formation and consequently, on structure and properties of final materials. The study showed that the conditions of the environment affected the sensors characteristics markedly, which can be improved by choosing of the right procedure of forming and treatment. Influence of type and additive substances quantity into doped films was discussed in the paper

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