ZnS:Mn thin-film electroluminescent devices prepared by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(96)00321-1 ◽

1996 ◽

Vol 169 (1) ◽

pp. 33-39 ◽

Author(s):

Hideki Kina ◽

Yoji Yamada ◽

Yukihiro Maruta ◽

Yukihisa Tamura

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Electroluminescent Devices ◽

Metalorganic Chemical

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Preparation of AlN:Mn films by metalorganic chemical vapor deposition for thin film electroluminescent devices

physica status solidi (c) ◽

10.1002/pssc.200303318 ◽

2003 ◽

Vol 0 (7) ◽

pp. 2274-2277 ◽

Author(s):

K. Hara ◽

A. Sato ◽

K. Azumada ◽

T. Atsumori ◽

M. Shiratori

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Electroluminescent Devices ◽

Metalorganic Chemical

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Ferroelectric SrBi2Ta2O9 thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581554 ◽

1999 ◽

Vol 17 (1) ◽

pp. 83-87 ◽

Author(s):

Nak-Jin Seong ◽

Eun-Suck Choi ◽

Soon-Gil Yoon

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Bottom Electrode ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Metalorganic Chemical

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Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film

Materials Science Forum ◽

10.4028/www.scientific.net/msf.140-142.457 ◽

1993 ◽

Vol 140-142 ◽

pp. 457-464

Author(s):

Kenji Ebihara ◽

Tomoaki Ikegami

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

High Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Film ◽

High Temperature Superconducting ◽

Metalorganic Chemical

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The deposition behavior of SiO[sub 2]–TiO[sub 2] thin film by metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1287154 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2384 ◽

Author(s):

Si-Moo Lee ◽

Jeong-Hoon Park ◽

Kug-Sun Hong ◽

Woon-Jo Cho ◽

Dong-Lae Kim

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Deposition Behavior ◽

Metalorganic Chemical

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Electrical Properties of SrBi2Ta2O9 (SBT) Thin Film Prepared by Metalorganic Chemical Vapor Deposition

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.181-182.93 ◽

2000 ◽

Vol 181-182 ◽

pp. 93-100

Author(s):

N. Nukaga ◽

Hiroshi Funakubo ◽

Ishikawa Kunio ◽

E. Shigeno ◽

Yutaka Sawada

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Phase transition of PbTiO3 polycrystalline thin film prepared by metalorganic chemical vapor deposition on yttrium stabilized zirconium

Solid State Communications ◽

10.1016/0038-1098(95)00465-3 ◽

1995 ◽

Vol 96 (7) ◽

pp. 477-480 ◽

Author(s):

Tao Yu ◽

Yan-Feng Chen ◽

Li Shun ◽

Jian-Xie Chen ◽

Nai-Ben Ming

Keyword(s):

Thin Film ◽

Phase Transition ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Polycrystalline Thin Film ◽

Metalorganic Chemical

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Thin film channel waveguides fabricated in metalorganic chemical vapor deposition grown BaTiO3 on MgO

Applied Physics Letters ◽

10.1063/1.117746 ◽

1996 ◽

Vol 69 (20) ◽

pp. 2968-2970 ◽

Author(s):

D. M. Gill ◽

B. A. Block ◽

C. W. Conrad ◽

B. W. Wessels ◽

S. T. Ho

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Channel Waveguides ◽

Metalorganic Chemical

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Thin Film Growth of Pb(Zr, Ti)O3by Photoenhanced Metalorganic Chemical Vapor Deposition Using NO2

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.4074 ◽

1993 ◽

Vol 32 (Part 1, No. 9B) ◽

pp. 4074-4077 ◽

Author(s):

Masaru Shimizu ◽

Takuma Katayama ◽

Masataka Sugiyama ◽

Tadashi Shiosaki

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Film Growth ◽

Chemical Vapor ◽

Thin Film Growth ◽

Metalorganic Chemical

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Enhancement-Mode ZnO Thin-Film Transistor Grown by Metalorganic Chemical Vapor Deposition

Applied Physics Express ◽

10.1143/apex.1.041202 ◽

2008 ◽

Vol 1 ◽

pp. 041202 ◽

Author(s):

Jungyol Jo ◽

Ogweon Seo ◽

Hyoshik Choi ◽

Byeonggon Lee

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Thin Film Transistor ◽

Chemical Vapor ◽

Zno Thin Film ◽

Enhancement Mode ◽

Metalorganic Chemical

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Luminescence of III-IV-V thin film alloys grown by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.5016443 ◽

2018 ◽

Vol 123 (17) ◽

pp. 175101 ◽

Author(s):

Roger Jia ◽

Tony Zhu ◽

Vladimir Bulović ◽

Eugene A. Fitzgerald

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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