Co-doping effects of Mg and Be on properties of ZnMgBeGaO UV-range transparent conductive oxide films prepared by RF magnetron sputtering

2014 ◽  
Vol 615 ◽  
pp. 126-130 ◽  
Author(s):  
Jang-Ho Park ◽  
Hoang Ba Cuong ◽  
Sang-Hun Jeong ◽  
Byung-Teak Lee
Keyword(s):  
Magnetron Sputtering ◽  
Oxide Films ◽  
Transparent Conductive Oxide ◽  
Rf Magnetron Sputtering ◽  
Co Doping ◽  
Doping Effects ◽  
Conductive Oxide ◽  
Uv Range

Development of a highly transparent, low-resistance lithium-doped nickel oxide triple-layer film deposited by magnetron sputtering

2017 ◽  
Vol 53 (10) ◽  
pp. 1634-1637 ◽  
Author(s):  
Chia-Ching Wu ◽  
Wei-Chen Shih
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Nickel Oxide ◽  
Transparent Conductive Oxide ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Glass Substrates ◽  
Triple Layer ◽  
Conductive Oxide

This research presents a triple-layer transparent conductive oxide thin film, with a lithium-doped nickel oxide/silver/lithium-doped nickel oxide (L-NiO/Ag/L-NiO) structure using radio-frequency (RF) magnetron sputtering on glass substrates.

Comparative study on early stages of film growth for transparent conductive oxide films deposited by dc magnetron sputtering

2008 ◽  
Vol 516 (14) ◽  
pp. 4598-4602 ◽  
Author(s):  
Yasushi Sato ◽  
Mikihiro Taketomo ◽  
Norihiro Ito ◽  
Amica Miyamura ◽  
Yuzo Shigesato
Keyword(s):  
Magnetron Sputtering ◽  
Comparative Study ◽  
Film Growth ◽  
Oxide Films ◽  
Transparent Conductive Oxide ◽  
Dc Magnetron Sputtering ◽  
Early Stages ◽  
Conductive Oxide

Influence of Thermal Annealing on Microstructures of Zinc Oxide Films Deposited by RF Magnetron Sputtering

2007 ◽  
Vol 46 (6A) ◽  
pp. 3319-3323 ◽  
Author(s):  
Takahiro Hiramatsu ◽  
Mamoru Furuta ◽  
Hiroshi Furuta ◽  
Tokiyoshi Matsuda ◽  
Takashi Hirao
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Thermal Annealing ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Zinc Oxide Films
Sign in / Sign up

Export Citation Format

Share Document