Influence of substrate bias on the structure and properties of ZrN films deposited by cathodic vacuum arc

Materials Science and Engineering A ◽

10.1016/j.msea.2007.02.085 ◽

2007 ◽

Vol 460-461 ◽

pp. 135-139 ◽

Author(s):

E.W. Niu ◽

L. Li ◽

G.H. Lv ◽

H. Chen ◽

W.R. Feng ◽

...

Keyword(s):

Substrate Bias ◽

Structure And Properties ◽

Influence Of Substrate

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Influence of substrate bias on the structure and properties of (Ti, Al)N films deposited by filtered cathodic vacuum arc

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1368840 ◽

2001 ◽

Vol 19 (3) ◽

pp. 736-742 ◽

Author(s):

Y. H. Cheng ◽

B. K. Tay ◽

S. P. Lau ◽

X. Shi

Keyword(s):

Substrate Bias ◽

Structure And Properties ◽

Influence Of Substrate ◽

Filtered Cathodic Vacuum Arc

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Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2016.08.047 ◽

2016 ◽

Vol 616 ◽

pp. 521-529 ◽

Author(s):

N. Saoula ◽

N. Madaoui ◽

R. Tadjine ◽

R.M. Erasmus ◽

S. Shrivastava ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Substrate Bias ◽

Structure And Properties ◽

Radio Frequency Magnetron Sputtering ◽

Influence Of Substrate

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Influence of substrate bias on the microstructure and internal stress in Cu films deposited by filtered cathodic vacuum arc

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1374619 ◽

2001 ◽

Vol 19 (5) ◽

pp. 2102-2108 ◽

Author(s):

Y. H. Cheng ◽

B. K. Tay ◽

S. P. Lau ◽

X. Shi ◽

H. S. Tan

Keyword(s):

Internal Stress ◽

Substrate Bias ◽

Cu Films ◽

Influence Of Substrate ◽

Filtered Cathodic Vacuum Arc

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Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2011.12.048 ◽

2012 ◽

Vol 258 (8) ◽

pp. 3864-3870 ◽

Author(s):

Yanhong Lv ◽

Li Ji ◽

Xiaohong Liu ◽

Hongxuan Li ◽

Huidi Zhou ◽

...

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Influence Of Substrate

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Influence of substrate bias, deposition temperature and post-deposition annealing on the structure and properties of multi-principal-component (AlCrMoSiTi)N coatings

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.12.014 ◽

2008 ◽

Vol 202 (14) ◽

pp. 3360-3366 ◽

Author(s):

Hui-Wen Chang ◽

Ping-Kang Huang ◽

Jien-Wei Yeh ◽

Andrew Davison ◽

Chun-Huei Tsau ◽

...

Keyword(s):

Deposition Temperature ◽

Principal Component ◽

Substrate Bias ◽

Structure And Properties ◽

Post Deposition Annealing ◽

Influence Of Substrate ◽

Post Deposition

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Influence of substrate bias voltage on structure and properties of Cr–Mo–Si–N coatings prepared by a hybrid coating system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2008.06.125 ◽

2008 ◽

Vol 203 (5-7) ◽

pp. 624-627 ◽

Author(s):

Seung Gyun Hong ◽

Se-Hun Kwon ◽

Sang-Won Kang ◽

Kwang Ho Kim

Keyword(s):

Bias Voltage ◽

Hybrid Coating ◽

Coating System ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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Influence of substrate bias on the mechanical properties of ta-C:Co films prepared by filtered cathodic vacuum arc technique

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00067-7 ◽

2003 ◽

Vol 169-170 ◽

pp. 393-396 ◽

Author(s):

J.X. Guo ◽

B.K. Tay ◽

X.W. Sun ◽

X.Z. Ding ◽

D.H.C. Chua

Keyword(s):

Mechanical Properties ◽

Substrate Bias ◽

Influence Of Substrate ◽

Filtered Cathodic Vacuum Arc

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Influence of pulsed substrate bias on the structure and properties of Ti–Al–N films deposited by cathodic vacuum arc

Applied Surface Science ◽

10.1016/j.apsusc.2012.03.100 ◽

2012 ◽

Vol 258 (19) ◽

pp. 7274-7279 ◽

Author(s):

G.P. Zhang ◽

G.J. Gao ◽

X.Q. Wang ◽

G.H. Lv ◽

L. Zhou ◽

...

Keyword(s):

Substrate Bias ◽

Structure And Properties

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Influence of substrate bias voltage on structure and properties of DC magnetron sputtered Ni–Zr alloy thin films

Journal of Materials Research ◽

10.1557/jmr.2020.89 ◽

2020 ◽

Vol 35 (12) ◽

pp. 1543-1555 ◽

Author(s):

Bibhu Prasad Sahu ◽

Amlan Dutta ◽

Rahul Mitra

Keyword(s):

Bias Voltage ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Influence Of Substrate ◽

Image Position ◽

Abstract

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Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering

Diamond and Related Materials ◽

10.1016/j.diamond.2006.03.012 ◽

2007 ◽

Vol 16 (1) ◽

pp. 29-36 ◽

Author(s):

J. Houška ◽

J. Vlček ◽

Š. Potocký ◽

V. Peřina

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Reactive Magnetron Sputtering ◽

Substrate Bias ◽

Reactive Magnetron ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Influence Of Substrate

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