Light emission characteristics and negative resistance phenomenon of Si-based metal/insulator/semiconductor tunnel junction

2000 ◽  
Vol 161 (1-2) ◽  
pp. 9-13 ◽  
Author(s):  
MaoXiang Wang ◽  
JianHua Yu ◽  
ChengXiu Sun
MRS Advances ◽  
2016 ◽  
Vol 1 (23) ◽  
pp. 1709-1713
Author(s):  
Hasan Goktas ◽  
Volker J. Sorger

ABSTRACTHere we fabricated and characterized a CMOS compatible metal-insulator-semiconductor (MIS) plasmonic tunnel junction for Si-based photonic circuitry. A grating structure was realized on MIS plasmonic tunnel junction via focused-ion-beam milling (FIB) to increase the intensity of the light emission that occurs during inelastic electron tunneling. Approximately 65 times higher intensity of light emission is achieved with the grating structure during the measurements.


1991 ◽  
Vol 60 (12) ◽  
pp. 4366-4373 ◽  
Author(s):  
Yuji Hirao ◽  
Yoshiki Naoi ◽  
Yoshinobu Nagano ◽  
Masuo Fukui

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