Substrate bias effect on amorphous nitrogenated carbon films deposited by filtered arc deposition

2002 ◽  
Vol 11 (3-6) ◽  
pp. 1227-1233 ◽  
Author(s):  
Yan-Way Li ◽  
Yew-Bin Shue ◽  
Chia-Fu Chen ◽  
Teng-Chien Yu ◽  
Jack Jyh-Kau Chang
Keyword(s):  
Carbon Films ◽  
Substrate Bias ◽  
Bias Effect ◽  
Arc Deposition ◽  
Nitrogenated Carbon

Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition

2001 ◽  
Vol 40 (Part 1, No. 11) ◽  
pp. 6574-6580 ◽  
Author(s):  
Yan-Way Li ◽  
Chia-Fu Chen ◽  
Yew-Bin Shue ◽  
Teng-Chien Yu ◽  
Jack Jyh-Kau Chang
Keyword(s):  
Carbon Films ◽  
Substrate Bias ◽  
Bias Effect ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Amorphous Hydrogenated Carbon ◽  
Arc Deposition

Structure of high hardness cathodic-arc deposited carbon

1995 ◽  
Vol 53 ◽  
pp. 206-207
Author(s):  
D. L. Callahan ◽  
S. D. McAdams ◽  
S. Anders ◽  
A. Anders ◽  
I.G. Brown ◽  
...  
Keyword(s):  
High Hardness ◽  
Carbon Films ◽  
Peak Hardness ◽  
Nanocrystalline Phase ◽  
Substrate Bias ◽  
Plan View ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
Cathodic Arc ◽  
Arc Deposition

Carbon films exhibiting a peak hardness of 59 GPa have been produced using pulsebiased cathodic-arc deposition. This value is much greater than that expected of an amorphous "diamond-like" carbon (die) film and is well within the hardness range of chemically vapor-deposited diamond. Furthermore, this peak hardness is observed at an indentation depth of approximately 50 nm and not on the upper surface of the film. A structural analysis by transmission electron microscopy (TEM) has been conducted in order to explain these mechanical phenomena.Details of the sputtering apparatus are described elsewhere. Films for this study were deposited on silicon using a two-step process in which a thin layer, approximately 10 nm, was first deposited at a relatively high substrate bias (~2 kV) followed by growth of the majority of the film at a lower bias (~200 V). Plan-view examination of carbon films revealed both uniformly amorphous regions and extensive nanocrystalline phase regions.

scholarly journals Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
High Power ◽  
Deposition Temperature ◽  
Average Power ◽  
Carbon Films ◽  
Strengthening Effect ◽  
Substrate Bias ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

Analysis of the substrate bias effect on the interface trapped charges in junctionless nanowire transistors through low-frequency noise characterization

2017 ◽  
Vol 178 ◽  
pp. 17-20 ◽  
Author(s):  
Rodrigo Trevisoli Doria ◽  
Renan Trevisoli ◽  
Michelly de Souza ◽  
Sylvain Barraud ◽  
Maud Vinet ◽  
...  
Keyword(s):  
Low Frequency ◽  
Frequency Noise ◽  
Substrate Bias ◽  
Low Frequency Noise ◽  
Bias Effect ◽  
Nanowire Transistors ◽  
Noise Characterization

Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov
Keyword(s):  
Amorphous Phase ◽  
Ion Beam ◽  
High Energy ◽  
Carbon Films ◽  
Ion Source ◽  
Ordered Structure ◽  
Deposition Technique ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

scholarly journals Robust low friction performance of graphene sheets embedded carbon films coated orthodontic stainless steel archwires

Friction ◽  
2021 ◽  
Author(s):  
Zonglin Pan ◽  
Qinzhao Zhou ◽  
Pengfei Wang ◽  
Dongfeng Diao
Keyword(s):  
Stainless Steel ◽  
Friction Coefficient ◽  
Orthodontic Treatment ◽  
Artificial Saliva ◽  
Carbon Film ◽  
Carbon Films ◽  
Graphene Sheets ◽  
Substrate Bias ◽  
Low Friction ◽  
Substrate Bias Voltage

AbstractReducing the friction force between the commercial archwire and bracket during the orthodontic treatment in general dental practice has attracted worldwide interest. An investigation on the friction and wear behaviors of the uncoated and carbon film coated stainless steel archwires running against stainless steel brackets was systematically conducted. The carbon films were prepared at substrate bias voltages from +5 to +50 V using an electron cyclotron resonance plasma sputtering system. With increasing substrate bias voltage, local microstructures of the carbon films evolved from amorphous carbon to graphene nanocrystallites. Both static and stable friction coefficients of the archwire-bracket contacts sliding in dry and wet (artificial saliva) conditions decreased with the deposition of carbon films on the archwires. Low friction coefficient of 0.12 was achieved in artificial saliva environment for the graphene sheets embedded carbon (GSEC) film coated archwire. Deterioration of the friction behavior of the GSEC film coated archwire occurred after immersion of the archwire in artificial saliva solution for different periods before friction test. However, moderate friction coefficient of less than 0.30 sustained after 30 days immersion periods. The low friction mechanism is clarified to be the formation of salivary adsorbed layer and graphene sheets containing tribofilm on the contact interfaces. The robust low friction and low wear performances of the GSEC film coated archwires make them good candidates for clinical orthodontic treatment applications.

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