Enabling Low-Temperature Deposition of High-Efficiency CIGS Solar Cells with a Modified Three-Stage Co-Evaporation Process

2020 ◽  
Vol 3 (5) ◽  
pp. 4201-4207 ◽  
Author(s):  
Weimin Li ◽  
Lin Yao ◽  
Kaili Li ◽  
Xin Li ◽  
Bing Yang ◽  
...  
2001 ◽  
Vol 664 ◽  
Author(s):  
Y. Nasuno ◽  
M. Kondo ◽  
A. Matsuda

ABSTRACTHydrogenated microcrystalline silicon (µc-Si:H) p-i-n solar cells have been prepared using a conventional RF plasma-enhanced chemical vapor deposition (PECVD) method at a low process temperature of 140 °C. The low temperature deposition of µc-Si:H has been found to be effective to suppress the formation of oxygen-related donors that cause a reduction in open circuit voltage (Voc) due to shunt leakage. We demonstrate the improvement of Voc by lowering the deposition temperature down to 140, while suppressing the reduction in high short circuit current density (Jsc) and fill factor (FF). A high efficiency of 8.9% was obtained using an Aasahi-U substrate. Furthermore, by optimizing textured structures on ZnO transparent conductive oxide (TCO) substrates, an efficiency of 9.4% (Voc=0.526V, Jsc=25.3mA/cm2, FF=0.710) was obtained. In addition, relatively high efficiency of 8.1% was achieved using VHF (60MHz) plasma at a deposition rate of 12 Å/s. Thus, this low temperature deposition technique for µc-Si:H is promising for both high efficiency and high rate deposition of µc-Si:H solar cells.


Solar Energy ◽  
2016 ◽  
Vol 139 ◽  
pp. 13-18 ◽  
Author(s):  
Andrei Salavei ◽  
Daniele Menossi ◽  
Fabio Piccinelli ◽  
Arun Kumar ◽  
Gino Mariotto ◽  
...  

2017 ◽  
Vol 412 ◽  
pp. 52-57 ◽  
Author(s):  
Nicholas Cavallari ◽  
Francesco Pattini ◽  
Stefano Rampino ◽  
Filippo Annoni ◽  
Mario Barozzi ◽  
...  

2009 ◽  
Vol 207 (3) ◽  
pp. 730-733 ◽  
Author(s):  
V. D. Novruzov ◽  
N. M. Fathi ◽  
O. Gorur ◽  
M. Tomakin ◽  
A. I. Bayramov ◽  
...  

RSC Advances ◽  
2016 ◽  
Vol 6 (71) ◽  
pp. 66705-66711 ◽  
Author(s):  
Patricie Heinrichova ◽  
Petr Dzik ◽  
Jakub Tkacz ◽  
Martin Vala ◽  
Martin Weiter

This article is focused on the development of new formulations of inks for low-temperature deposition of printed electron transport layers based on titanium oxide.


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