Brillouin light scattering studies of the mechanical properties of ultrathin low-k dielectric films

2006 ◽  
Vol 100 (1) ◽  
pp. 013507 ◽  
Author(s):  
A. Link ◽  
R. Sooryakumar ◽  
R. S. Bandhu ◽  
G. A. Antonelli
2005 ◽  
Vol 493 (1-2) ◽  
pp. 175-178 ◽  
Author(s):  
G. Carlotti ◽  
N. Chérault ◽  
N. Casanova ◽  
C. Goldberg ◽  
G. Socino

2003 ◽  
Vol 766 ◽  
Author(s):  
Jin-Heong Yim ◽  
Jung-Bae Kim ◽  
Hyun-Dam Jeong ◽  
Yi-Yeoul Lyu ◽  
Sang Kook Mah ◽  
...  

AbstractPorous low dielectric films containing nano pores (∼20Å) with low dielectric constant (<2.2), have been prepared by using various kinds of cyclodextrin derivatives as porogenic materials. The pore structure such as pore size and interconnectivity can be controlled by changing functional groups of the cyclodextrin derivatives. We found that mechanical properties of porous low-k thin film prepared with mCSSQ (modified cyclic silsesquioxane) precursor and cyclodextrin derivatives were correlated with the pore interconnection length. The longer the interconnection length of nanopores in the thin film, the worse the mechanical properties of the thin film (such as hardness and modulus) even though the pore diameter of the films were microporous (∼2nm).


2019 ◽  
Vol 122 (1) ◽  
Author(s):  
Jérémie Margueritat ◽  
Angélique Virgone-Carlotta ◽  
Sylvain Monnier ◽  
Hélène Delanoë-Ayari ◽  
Hichem C. Mertani ◽  
...  

2002 ◽  
Vol 750 ◽  
Author(s):  
Alex A. Volinsky ◽  
Manuel-Luis B. Palacio ◽  
William W. Gerberich

ABSTRACTNew Low-K dielectric constant materials development is underway. Introducing porosity is one of the ways to lower the dielectric constant. Those are typically spin coated organic filled glasses. The pore size is on the order of a several nanometers and pore introduction compromises mechanical properties of low-K thin films, especially fracture toughness, as these materials are typically brittle.In our previous studies we have evaluated different low-K dielectric constant materials in terms of their mechanical properties using nanoindentation. It was interesting to see that for a large range of various porous low-K materials the modulus-to-hardness ratio was constant. It was also found that the indenter contact is mostly elastic, as the loading and unloading portions of the load-displacement curve did not show any hysteresis, following indentation depth to the 3/2 power load dependence. Based on these results current analysis explains the observed constant modulus-to-hardness ratio.The paper also describes the “incompressible” pore effect. As a particle gets smaller, the yield stress increases due to the Hall-Petch effect, but for the nanometer-size particles there are also high surface energy contributions that prevent is from deforming plastically. The same approach can be applied for a nanometer size pore elastic deformation, thus we call it an “incompressible” pore concept.


2000 ◽  
Vol 377-378 ◽  
pp. 413-417 ◽  
Author(s):  
Jinguo Wang ◽  
H.K Kim ◽  
Frank G. Shi ◽  
Bin Zhao ◽  
T.G. Nieh

2001 ◽  
Vol 695 ◽  
Author(s):  
J. B. Vella ◽  
Q. Xie ◽  
N. V. Edwards ◽  
J. Kulik ◽  
K. H. Junker

ABSTRACTLow-k material integration issues that plague the microelectronics industry include the compromise in mechanical properties that one incurs in abandoning fully dense silica dieletrics. Typical elastic moduli of OSG low-k dieletric films are 2-10 GPa with corresponding hardnesses of 0.5 to 1.5 GPa. In the present study, the hardness and elastic modulus properties measured by nanoindentation of porous silica based low-k films are correlated with in initial estimates of density using a novel technique of spectroscopic ellispsometry. Transmission electron microscopy and X-ray photoelectron spectroscopy show the structural and chemical similarity of the films. Nanoindentation and spectroscopic ellipsometry results reflect significant deviations in material behavior from that expected from a simple model of silica (SiO2) with included voids or porosity, suggesting that the methyl groups are actively participating in the mechanical and optical properties of the material.


2001 ◽  
Vol 90 (8) ◽  
pp. 3771-3779 ◽  
Author(s):  
P. Djemia ◽  
C. Dugautier ◽  
T. Chauveau ◽  
E. Dogheche ◽  
M. I. De Barros ◽  
...  

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