High mobility Ge pMOS fabricated using a novel heteroepitaxial ge on Si growth method
Keyword(s):
1994 ◽
Vol 52
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pp. 700-701
Keyword(s):
1994 ◽
Vol 52
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pp. 550-551
2007 ◽
Vol 2007
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pp. 128-129
1998 ◽
Vol 08
(PR3)
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pp. Pr3-57-Pr3-60
2011 ◽
Vol 183
(S 01)
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