GaN-based quasi-vertical Schottky barrier diodes with the sidewall field plate termination for obtaining low leakage current and high breakdown voltage

Author(s):  
Fuping Huang ◽  
Chunshuang Chu ◽  
Yonghui Zhang ◽  
Kangkai Tian ◽  
Xingyu Jia ◽  
...  
2021 ◽  
Vol 15 (1) ◽  
pp. 016501
Author(s):  
Fumio Otsuka ◽  
Hironobu Miyamoto ◽  
Akio Takatsuka ◽  
Shinji Kunori ◽  
Kohei Sasaki ◽  
...  

Abstract We fabricated high forward and low leakage current trench MOS-type Schottky barrier diodes (MOSSBDs) in combination with a field plate on a 12 μm thick epitaxial layer grown by halide vapor phase epitaxy on β-Ga2O3 (001) substrate. The MOSSBDs, measuring 1.7 × 1.7 mm2, exhibited a forward current of 2 A (70 A cm−2) at 2 V forward voltage and a leakage current of 5.7 × 10–10 A at −1.2 kV reverse voltage (on/off current ratio of > 109) with an ideality factor of 1.05 and wafer-level specific on-resistance of 17.1 mΩ · cm2.


2021 ◽  
Vol 119 (26) ◽  
pp. 263508
Author(s):  
Luca Nela ◽  
Catherine Erine ◽  
Elison Matioli

1990 ◽  
Author(s):  
Tai Ping Sun ◽  
Si-Chen Lee ◽  
Kou-Chen Liu ◽  
Sheng-Jehn Yang

2014 ◽  
Vol 7 (4) ◽  
pp. 041003 ◽  
Author(s):  
Joseph J. Freedsman ◽  
Takashi Egawa ◽  
Yuya Yamaoka ◽  
Yoshiki Yano ◽  
Akinori Ubukata ◽  
...  

2004 ◽  
Author(s):  
Seung-Chul Lee ◽  
Jin-Cherl Her ◽  
Min-Woo Ha ◽  
Kwang-Seok Seo ◽  
Min-Koo Han

2005 ◽  
Vol 2 (7) ◽  
pp. 2647-2650 ◽  
Author(s):  
Masahiko Kuraguchi ◽  
Yoshiharu Takada ◽  
Wataru Saito ◽  
Ichiro Omura ◽  
Kunio Tsuda

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