Deep Defects in Fe-Doped GaN Layers Analysed by Electrical and Photoelectrical Spectroscopic Methods

2003 ◽  
Vol 798 ◽  
Author(s):  
H. Witte ◽  
K. Fluegge ◽  
A. Dadgar ◽  
A. Krtschil ◽  
A. Krost ◽  
...  
Keyword(s):  
Deep Level ◽  
Iron Doping ◽  
Defect Level ◽  
Temperature Dependent ◽  
Organic Vapor ◽  
Sapphire Substrates ◽  
Metal Organic ◽  
Transient Spectroscopy ◽  
P Type ◽  
Co Doped

ABSTRACTThe electrical activity of iron in Fe- doped, and in Si and Mg co-doped GaN layers grown on sapphire substrates by metal organic vapor phase epitaxy was studied as shown by temperature dependent Hall Effect (TDH) measurements. In all samples iron doping generates an acceptor defect, which compensates donors in n-type GaN. Furthermore, iron doping causes strong potential inhomogeneities, which decrease the Hall mobility in the layers. To verify, if iron creates only hole traps, defects in n-type Si:Fe and Fe doped samples were investigated. The well known dominant electron traps in n-type GaN at 520 – 550 meV and 480 meV were found by deep level transient spectroscopy and thermal admittance spectroscopy, respectively. A high Fe-doped GaN layer shows a low p-type conductivity dominated by the iron acceptor. An activation energy of EV+ 460 meV was determined by TDH indicating, that the iron acceptor correlates with this defect level.

Electron Traps in n-GaN Grown on Si (111) Substrates by MOVPE

2008 ◽  
Vol 1068 ◽  
Author(s):  
Tsuneo Ito ◽  
Yutaka Terada ◽  
Takashi Egawa
Keyword(s):  
Sapphire Substrate ◽  
Deep Level ◽  
Buffer Layers ◽  
Si Substrate ◽  
Electron Traps ◽  
Organic Vapor ◽  
Pair Number ◽  
Metal Organic ◽  
Transient Spectroscopy ◽  
Gan On Si

ABSTRACTDeep level electron traps in n-GaN grown by metal organic vapor phase epitaxy (MOVPE) on Si (111) substrate were studied by means of deep level transient spectroscopy (DLTS). The growth of n-GaN on different pair number of AlN/GaN superlattice buffer layers (SLS) system and on c-face sapphire substrate are compared. Three deep electron traps labeled E4 (0.7-0.8 eV), E5 (1.0-1.1 eV), were observed in n-GaN on Si substrate. And the concentrations of these traps observed for n-GaN on Si are very different from that on sapphire substrate. E4 is the dominant of these levels for n-GaN on Si substrate, and it behaves like point-defect due to based on the analysis by electron capture kinetics, in spite of having high dislocation density of the order of 1010 cm−3.

Hydrogen-Induced Dissociation of the Fe-B Pair in Boron-Doped P-Type Silicon

2011 ◽  
Vol 178-179 ◽  
pp. 183-187
Author(s):  
Chi Kwong Tang ◽  
Lasse Vines ◽  
Bengt Gunnar Svensson ◽  
Eduard Monakhov
Keyword(s):  
Deep Level ◽  
Schottky Diodes ◽  
Depletion Region ◽  
Charge Carrier Concentration ◽  
Defect Level ◽  
Boron Doped ◽  
Capacitance Voltage ◽  
Wet Chemical ◽  
Transient Spectroscopy ◽  
P Type

The interaction between hydrogen and the iron-boron pair (Fe-B) has been investigated in iron-contaminated boron-doped Cz-Si using capacitance-voltage measurements (CV) and deep level transient spectroscopy (DLTS). Introduction of hydrogen was performed by wet chemical etching and subsequent reverve bias annealing of Al Schottky diodes. The treatment led to the appearance of the defect level characteristic to interstitial iron (Fei) with a corresponding decrease in the concentration of the Fe-B pair. Concentration versus depth profiles of the defects show that dissociation of Fe-B occurs in the depletion region and capacitance-voltage measurements unveil a decrease in the charge carrier concentration due to passivation of B. These quantitative observations imply strongly that H promotes dissociation of Fe-B releasing Fei whereas no detectable passivation of Fe-B or Fei by H occurs.

scholarly journals Fermi Level Pinning at GaN-interfaces: Correlation of electrical admittance and transient spectroscopy

2000 ◽  
Vol 5 (S1) ◽  
pp. 936-942 ◽  
Author(s):  
H. Witte ◽  
A. Krtschil ◽  
M. Lisker ◽  
D. Rudloff ◽  
J. Christen ◽  
...  
Keyword(s):  
Fermi Level ◽  
Deep Level ◽  
Deep Levels ◽  
Admittance Spectroscopy ◽  
Zero Bias ◽  
Fermi Level Pinning ◽  
Organic Vapor ◽  
Pinning Effect ◽  
Metal Organic ◽  
Transient Spectroscopy

In GaN layers grown by molecular beam epitaxy as well as metal organic vapor phase epitaxy significant differences were found in the appearance of deep defects detected by thermal admittance spectroscopy as compared for deep level transient spectroscopy measurements. While, thermal admittance spectroscopy measurements which were made under zero bias conditions only show thermal emissions at activation energies between 130 and 170 meV, further deep levels existing in these GaN layers were evidenced by transient spectrocopy. This discrepancy is explained by a pinning effect of the Fermi level at the metal / GaN interface induced by high a concentration of the deep levels showing up in thermal admittance spectroscopy. We compare our results with a GaAs:Te Schottky- diode as a refernec sample. Here, both spectroscopic methods give exactly the same deep level emissions.

Fermi Level Pinning at GaN-Interfaces: Correlation of Electrical Admittance and Transient Spectroscopy

1999 ◽  
Vol 595 ◽  
Author(s):  
H. Witte ◽  
A. Krtschil ◽  
M. Lisker ◽  
D. Rudloff ◽  
J. Christen ◽  
...  
Keyword(s):  
Fermi Level ◽  
Deep Level ◽  
Deep Levels ◽  
Admittance Spectroscopy ◽  
Zero Bias ◽  
Fermi Level Pinning ◽  
Organic Vapor ◽  
Pinning Effect ◽  
Metal Organic ◽  
Transient Spectroscopy

AbstractIn GaN layers grown by molecular beam epitaxy as well as metal organic vapor phase epitaxy significant differences were found in the appearance of deep defects de-tected by thermal admittance spectroscopy as compared for deep level transient spectros-copy measurements. While, thermal admittance spectroscopy measurements which were made under zero bias conditions only show thermal emissions at activation energies between 130 and 170 meV, further deep levels existing in these GaN layers were evidenced by transient spectrocopy. This discrepancy is explained by a pinning effect of the Fermi level at the metal / GaN interface induced by high a concentration of the deep levels showing up in thermal admittance spectroscopy. We compare our results with a GaAs:Te Schottky- diode as a refernec sample. Here, both spectroscopic methods give exactly the same deep level emissions.

PL and DLTS Analysis of Carbon-Related Centers in Irradiated P-Type Cz-Si

2013 ◽  
Vol 205-206 ◽  
pp. 224-227 ◽  
Author(s):  
Bahman Raeissi ◽  
Naveengoud Ganagona ◽  
Augustinas Galeckas ◽  
Edouard V. Monakhov ◽  
Bengt Gunnar Svensson
Keyword(s):  
Heat Treatment ◽  
Proton Irradiation ◽  
Deep Level ◽  
Annealing Duration ◽  
Interstitial Oxygen ◽  
Defect Level ◽  
Interstitial Carbon ◽  
Transient Spectroscopy ◽  
P Type ◽  
Dlts Spectra

Photoluminescence (PL) and deep level transient spectroscopy (DLTS) have been used to investigate carbon related defects in p–type Cz–Si induced by proton irradiation. The interstitial carbon–interstitial oxygen (CiOi) level in DLTS and the corresponding C–line (789.5 meV) in PL spectra are detected in as–irradiated samples. Formations of the so–called P–line at 767 meV in PL and a new defect level at about 0.39 eV above the valence band edge, Ev, in the DLTS spectra are observed in the annealed samples. The evolution of the CiOiand Ev+0.39 eV levels in DLTS and also the C– and P– lines in PL upon post–irradiation heat–treatment is investigated, showing that the intensity of the CiOilevel decreases with heat–treatment, which is consistent with the PL data for the C–line. The intensity of the Ev+0.39 eV level is enhanced and then saturates with annealing duration. We tentatively assign this level to the interstitial carbon–oxygen dimer (CiO2i).

Deep Level Structure of Semi-Insulating Movpe Gaas Grown by Controlled Oxygen Incorporation

1993 ◽  
Vol 325 ◽  
Author(s):  
J. W. Huang ◽  
T. F. Kuech
Keyword(s):  
Deep Level ◽  
Level Structure ◽  
Resistivity Measurement ◽  
Conduction Band Edge ◽  
High Resistivity ◽  
Temperature Dependent ◽  
Temperature Dependent Resistivity ◽  
Transient Spectroscopy ◽  
Co Doped ◽  
Dlts Spectra

AbstractSemi-insulating oxygen-doped GaAs layers have been grown by low pressure metalorganic vapor phase epitaxy (MOVPE) using aluminum-oxygen bonding based precursor diethyl aluminum ethoxide (DEALO). Resistivities of more than 2x109 Ω-cm at 294 K have been achieved. Deep level structure responsible for the high resistivity was investigated by deep level transient spectroscopy (DLTS) using DEALO and disilane co-doped GaAs p+-n homojunction. Multiple deep level peaks were observed, and the relative peak heights were found to vary with the dopant concentrations. Major deep levels were electron traps with ionization energy between 0.75 and 0.95 eV below conduction band edge minimum. An activation energy of 0.81 eV was deduced from temperature-dependent resistivity measurement, and should be closely related to the major0.75 eV peak in DLTS spectra.

Spectrum of Defect States in Porous Organic Low-k Dielectric Films, Annealed in Argon and Nitrogen

2003 ◽  
Vol 766 ◽  
Author(s):  
V. Ligatchev ◽  
T.K.S. Wong ◽  
T.K. Goh ◽  
Rusli Suzhu Yu
Keyword(s):  
Deep Level ◽  
Dielectric Films ◽  
Silicon Substrates ◽  
Reverse Bias Voltage ◽  
Defect States ◽  
Single Side ◽  
Sandwich Type ◽  
Transient Spectroscopy ◽  
P Type ◽  
Spectrum Deconvolution

AbstractDefect spectrum N(E) of porous organic dielectric (POD) films is studied with capacitance deep-level-transient-spectroscopy (C-DLTS) in the energy range up to 0.7 eV below conduction band bottom Ec. The POD films were prepared by spin coating onto 200mm p-type (1 – 10 Δcm) single-side polished silicon substrates followed by baking at 325°C on a hot plate and curing at 425°C in furnace. The film thickness is in the 5000 – 6000 Å range. The ‘sandwich’ -type NiCr/POD/p-Si/NiCr test structures showed both rectifying DC current-voltage characteristics and linear 1/C2 vs. DC reverse bias voltage. These confirm the applicability of the C-DLTS technique for defect spectrum deconvolution and the n-type conductivity of the studied films. Isochronal annealing (30 min in argon or 60 min in nitrogen) has been performed over the temperature range 300°C - 650°C. The N(E) distribution is only slightly affected by annealing in argon. However, the distribution depends strongly on the annealing temperature in nitrogen ambient. A strong N(E) peak at Ec – E = 0.55 – 0.60 eV is detected in all samples annealed in argon but this peak is practically absent in samples annealed in nitrogen at Ta < 480°C. On the other hand, two new peaks at Ec – E = 0.12 and 0.20 eV appear in the N(E) spectrum of the samples annealed in nitrogen at Ta = 650°C. The different features of the defect spectrum are attributed to different interactions of argon and nitrogen with dangling carbon bonds on the intra-pore surfaces.

Electron Irradiation Induced Trap In N-Type Gan

1997 ◽  
Vol 482 ◽  
Author(s):  
Z-Q. Fang ◽  
J. W. Hemsky ◽  
D. C. Look ◽  
M. P. Mack ◽  
R. J. Molnar ◽  
...  
Keyword(s):  
Electron Irradiation ◽  
Deep Level Transient Spectroscopy ◽  
Deep Level ◽  
Chemical Vapor ◽  
Hydride Vapor Phase Epitaxy ◽  
Organic Chemical ◽  
Electric Field Effects ◽  
Metal Organic ◽  
Transient Spectroscopy ◽  
Organic Chemical Vapor Deposition

AbstractA 1-MeV-electron-irradiation (EI) induced trap at Ec-0.18 eV is found in n-type GaN by deep level transient spectroscopy (DLTS) measurements on Schottky barrier diodes, fabricated on both metal-organic-chemical-vapor-deposition and hydride-vapor-phase-epitaxy material grown on sapphire. The 300-K carrier concentrations of the two materials are 2.3 × 1016 cm−3 and 1.3 × 1017 cm−3, respectively. Up to an irradiation dose of 1 × 1015 cm−2, the electron concentrations and pre-existing traps in the GaN layers are not significantly affected, while the EI-induced trap is produced at a rate of at least 0.2 cm−1. The DLTS peaks in the two materials are shifted slightly, possibly due to electric-field effects. Comparison with theory suggests that the defect is most likely associated with the N vacancy or Ga interstitial.

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