Voltage Instability Alleviation through FACTS Controllers

Author(s):  
Shaik Affijulla ◽  
Sushil Chauhan
Author(s):  
V. C. Nikolaidis ◽  
C. D. Vournas ◽  
G. A. Fotopoulos ◽  
G. P. Christoforidis ◽  
E. Kalfaoglou ◽  
...  

2013 ◽  
Vol 21 ◽  
pp. 1685-1702 ◽  
Author(s):  
Maghsood MOKHTARI ◽  
Javad KHAZAIE ◽  
Daryoush NAZARPOUR ◽  
Morteza FARSADI

2013 ◽  
Vol 811 ◽  
pp. 643-646
Author(s):  
Xue Song Zhou ◽  
Mo Chen ◽  
You Jie Ma

In order to study on the problem of voltage stability of power system, this paper describes the static bifurcation analysis and the dynamic bifurcation analysis in voltage stabilization analysis of power system and its relationship with the voltage stability,discusses the voltage instability caused by two main bifurcation formal definition, the occurrence of the conditions and the calculation of the bifurcation point, and points out advantages and disadvantages of various algorithms. Finally the paper looks forward to further study of the bifurcation theory in terms of voltage stability.


2008 ◽  
Vol 23 (4) ◽  
pp. 2591-2598 ◽  
Author(s):  
Xia Jiang ◽  
Xinghao Fang ◽  
J.H. Chow ◽  
A.-A. Edris ◽  
E. Uzunovic ◽  
...  

2016 ◽  
Vol 858 ◽  
pp. 465-468 ◽  
Author(s):  
D.P. Ettisserry ◽  
Neil Goldsman ◽  
Akin Akturk ◽  
Aivars J. Lelis

In this work, we investigate the behavior of Nitrogen atoms at 4H-Silicon Carbide (4H-SiC)/Silicon dioxide (SiO2) interface during nitric oxide passivation using ab-initio Density Functional Theory. Our calculations suggest different possible energetically favorable and competing mechanisms by which nitrogen atoms could a) incorporate themselves into the oxide, just above the 4H-SiC substrate, and b) substitute for carbon atoms at the 4H-SiC surface. We attribute the former process to cause increased threshold voltage instability (hole traps), and the latter to result in improved effective mobility through channel counter-doping, apart from removing interface traps in 4H-SiC power MOSFETs. These results support recent electrical and XPS measurements. Additionally, Nitric Oxide passivation is shown to energetically favor re-oxidation of the 4H-SiC surface accompanied by the generation of oxygen vacancies under the conditions considered in this work.


Sign in / Sign up

Export Citation Format

Share Document