phonon drag
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Nanomaterials ◽  
2021 ◽  
Vol 11 (12) ◽  
pp. 3364
Author(s):  
Gennady M. Gusev ◽  
Ze D. Kvon ◽  
Alexander D. Levin ◽  
Nikolay N. Mikhailov

The thermoelectric response of 80 nm-thick strained HgTe films of a three-dimensional topological insulator (3D TI) has been studied experimentally. An ambipolar thermopower is observed where the Fermi energy moves from conducting to the valence bulk band. The comparison between theory and experiment shows that the thermopower is mostly due to the phonon drag contribution. In the region where the 2D Dirac electrons coexist with bulk hole states, the Seebeck coefficient is modified due to 2D electron–3D hole scattering.


Author(s):  
Kasala Suresha

Abstract: Similar to graphene, zero band gap limits the application of Silicene in nanoelectronics despite of its high carrier mobility. In this article we calculate the contribution of electron-phonon interaction to thermoelectric effects in silicene. One considers the case of free standing silicene taking into account interaction with intrinsic acoustic phonons. The temperature considered here is at room temperature. We noticed that the contribution to thermoelectromotive force due to electron drag by phonons is determined by the Fermi energy. The explicit temperature dependence of the contribution to thermoelectromotive force deriving from by phonons is weak in contrast to that due to diffusion, which is directly proportional to temperature. Thus a theoretical limit has been established for a possible increase of the thermoelectromotive force through electron drag by the intrinsic phonons of silicene. Keywords: Phonon-drag thermopower, electron-diffusion thermopower, silicene, fermi energy, zero band gap


Nano Letters ◽  
2021 ◽  
Author(s):  
Masatoshi Kimura ◽  
Xinyi He ◽  
Takayoshi Katase ◽  
Terumasa Tadano ◽  
Jan M. Tomczak ◽  
...  
Keyword(s):  

2021 ◽  
Vol 104 (11) ◽  
Author(s):  
Xitong Xu ◽  
Yiyuan Liu ◽  
Gabriel Seyfarth ◽  
Alexandre Pourret ◽  
Wenlong Ma ◽  
...  

2020 ◽  
Vol 5 (1) ◽  
Author(s):  
Alexandre Jaoui ◽  
Gabriel Seyfarth ◽  
Carl Willem Rischau ◽  
Steffen Wiedmann ◽  
Siham Benhabib ◽  
...  

AbstractLightly doped III–V semiconductor InAs is a dilute metal, which can be pushed beyond its extreme quantum limit upon the application of a modest magnetic field. In this regime, a Mott-Anderson metal–insulator transition, triggered by the magnetic field, leads to a depletion of carrier concentration by more than one order of magnitude. Here, we show that this transition is accompanied by a 200-fold enhancement of the Seebeck coefficient, which becomes as large as 11.3 mV K−1$$\approx 130\frac{{k}_{B}}{e}$$ ≈ 130 k B e at T = 8 K and B = 29 T. We find that the magnitude of this signal depends on sample dimensions and conclude that it is caused by phonon drag, resulting from a large difference between the scattering time of phonons (which are almost ballistic) and electrons (which are almost localized in the insulating state). Our results reveal a path to distinguish between possible sources of large thermoelectric response in other low-density systems pushed beyond the quantum limit.


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