Improving the Specific Surface Area of Etched Aluminum Foil by Fabricating the Micro/Nano Structure

Aluminum foil with micro/nano structure has been prepared by electrochemical DC etching and a subsequent anodization treatment followed by removal of the alumina film. When the micron-sized tunnels were generated on the etched aluminum foil, the size and distribution of the nano-concave formed on the sidewall of the etched tunnels varied with the anodized time in H2SO4 and C4H6O6 electrolyte. The optimal value of the specific surface area for the aluminum foil with micro/nano structure is approximately four times larger than that of the only etched aluminum foil. It is indicated from the chronoamperometry and BET measurements that the specific capacitance of aluminum foil with micro/nano structure can be significantly improved by suitable anodization in H2SO4 electrolyte, in comparison with a comparatively small increasement in C4H6O6 electrolyte. This can be attributed to the fact that the tardy anodization process will consume a considerable amount of aluminum substrate, resulting in the aggravation of the merged tunnels.

Porous Alumina Films Fabricated by Reduced Temperature Sulfuric Acid Anodizing: Morphology, Composition and Volumetric Growth

The volumetric growth, composition, and morphology of porous alumina films fabricated by reduced temperature 280 K galvanostatic anodizing of aluminum foil in 0.4, 1.0, and 2.0 M aqueous sulfuric acid with 0.5–10 mA·cm−2 current densities were investigated. It appeared that an increase in the solution concentration from 0.4 to 2 M has no significant effect on the anodizing rate, but leads to an increase in the porous alumina film growth. The volumetric growth coefficient increases from 1.26 to 1.67 with increasing current density from 0.5 to 10 mA·cm−2 and decreases with increasing solution concentration from 0.4 to 2.0 M. In addition, in the anodized samples, metallic aluminum phases are identified, and a tendency towards a decrease in the aluminum content with an increase in solution concentration is observed. Anodizing at 0.5 mA·cm−2 in 2.0 M sulfuric acid leads to formation of a non-typical nanostructured porous alumina film, consisting of ordered hemispheres containing radially diverging pores.

Carbon Monoxide Oxidation over Gold Nanoparticles Deposited onto Alumina Film Grown on Mo(110) Substrate: An Effect of Charge Tunneling through the Oxide Film

Formation of gold nanosized particles supported by aluminum oxide film grown on Mo(110) substrate and oxidation of carbon monoxide molecules on their surface have been in-situ studied in ultra-high vacuum by means of Auger electron spectroscopy (AES), reflection-absorption infrared spectroscopy (RAIRS), low energy electron diffraction (LEED), atomic force microscopy (AFM), temperature-programmed desorption (TPD), and work function measurements. The main focus was to follow how the thickness of the alumina film influences the efficiency of CO oxidation in an attempt to find out evidence of the possible effect of electron tunneling between the metal substrate and the Au particle through the oxide interlayer. Providing the largest degree of surface identity of the studied metal/oxide system at different thicknesses of the alumina film (two, four, six, and eight monolayers), it was found that the CO oxidation efficiency, defined as CO2 to CO TPD peaks intensity ratio, exponentially decays with the oxide film thickness growth. Taking into account the known fact that the CO oxidation efficiency depends on the amount of excess charge acquired by Au particle, the latter suggests that electron tunneling adds efficiency to the oxidation process, although not significantly.