Growth of Ru2Si3 Polycrystalline Thin Films by Solid Phase Epitaxy in Ru-Si Amorphous Layers

Semiconducting ruthenium silicide (Ru2Si3) polycrystalline thin films were grown by solid phase epitaxy using Ru-Si amorphous layers on Si substrates. The formation of Ru2Si3 phase was confirmed by XRD and Raman measurements when the amorphous layers were annealed at 600−900 °C in a vacuum. The Ru2Si3 thin films showed a low electron density of 1 × 1016 cm-3 with a high mobility of 430−940 cm2V-1s-1. Photoluminescence (PL) at ~0.8 eV was observed in the Ru2Si3 films.

Ruthenium as Schottky metal for SiC-based high temperature hydrogen sensors

ABSTRACTSensor response characteristics of Ru/3C-SiC (epitaxial layer of SiC on Si substrates) Schottky junctions were studied at different temperatures (200 – 400 °C) in presence of varying concentrations of hydrogen from 5000 – 20000 ppm. The output signal of the sensor, the response time and the reversibility were investigated from the transient response characteristics of the sensors. The sensor parameters improved with higher operating temperature, up to 400 °C. The sensitivity of the sensors was found to be a function of applied bias across the Schottky junction. As compared with the Pd/3C-SiC junctions, the Ru/3C-SiC Schottky sensors showed higher resolution and better reversibility in the hydrogen concentration range 10000 to 20000 ppm. The SIMS (Secondary Ion Mass Spectrometry), RBS (Rutherford Backscattering Spectrometry) and GIXRD (Glancing Incidence X-ray Diffraction) studies indicated that up to 400 °C there was no formation of ruthenium silicide at the Ru/3C-SiC interface.