Microvalve with Trapezoid-Shaped Cross-Section for Deep Microchannels

Simple microfluidic systems for handling large particles such as three-dimensional (3D) cultured cells, microcapsules, and animalcules have contributed to the advancement of biology. However, obtaining a highly integrated microfluidic device for handling large particles is difficult because there are no suitable microvalves for deep microchannels. Therefore, this study proposes a microvalve with a trapezoid-shaped cross-section to close a deep microchannel. The proposed microvalve can close a 350 μm deep microchannel, which is suitable for handling hundreds of micrometer-scale particles. A double-inclined lithography process was used to fabricate the trapezoid-shaped cross-section. The microvalve was fabricated by bonding three polydimethylsiloxane layers: a trapezoid-shaped liquid channel layer, a membrane, and a pneumatic channel layer. The pneumatic balloon, consisting of the membrane and the pneumatic channel, was located beneath a trapezoid-shaped cross-section microchannel. The valve was operated by the application of pneumatic pressure to the pneumatic channel. We experimentally confirmed that the expansion of the pneumatic balloon could close the 350 μm deep microchannel.

Passive Control of Silane Diffusion for Gradient Application of Surface Properties

Liquid lithography represents a robust technique for fabricating three-dimensional (3D) microstructures on a two-dimensional template. Silanization of a surface is often a key step in the liquid lithography process and is used to alter the surface energy of the substrate and, consequently, the shape of the 3D microfeatures produced. In this work, we present a passive technique that allows for the generation of silane gradients along the length of a substrate. The technique relies on a secondary diffusion chamber with a single opening, leading to a directional introduction of silane to the substrate via passive diffusion. The secondary chamber geometry influences the deposited gradient, which is shown to be well captured by Monte Carlo simulations that incorporate the passive diffusion and grafting processes. The technique ultimately allows the user to generate a range of substrate wettabilities on a single chip, enhancing throughput for organ-on-a-chip applications by mimicking the spatial variability of tissue topographies present in vivo.

Simple Preparation of Polydimethylsiloxane and Polyurethane Blend Film for Marine Antibiofouling Application

A key way to prevent undesirable fouling of any structure in the marine environment, without harming any microorganisms, is to use a polymer film with high hydrophobicity. The polymer film, which was simply prepared from a blend of hydrophobic polydimethylsiloxane elastomer and hydrophilic polyurethane, showed improved properties and economic viability for antifouling film for the marine industry. The field emission scanning electron microscope and energy dispersive X-ray spectrometer (FESEM and EDX) results from the polymer blend suggested a homogenous morphology and good distribution of the polyurethane disperse phase. The PDMS:PU blend (95:5) film gave a water contact angle of 103.4° ± 3.8° and the PDMS film gave a water contact angle of 109.5° ± 4.2°. Moreover, the PDMS:PU blend (95:5) film could also be modified with surface patterning by using soft lithography process to further increase the hydrophobicity. It was found that PDMS:PU blend (95:5) film with micro patterning from soft lithography process increased the contact angle to 128.8° ± 1.6°. The results from a field test in the Gulf of Thailand illustrated that the bonding strength between the barnacles and the PDMS:PU blend (95:5) film (0.07 MPa) were lower than the bonding strength between the barnacles and the carbon steel (1.16 MPa). The barnacles on the PDMS:PU blend (95:5) film were more easily removed from the surface. This indicated that the PDMS:PU blend (95:5) exhibited excellent antifouling properties and the results indicated that the PDMS:PU blend (95:5) film with micro patterning surface could be employed for antifouling application.

Lau Effect Using LED Array for Lithography

Illumination with LEDs is of increasing interest in imaging and lithography. In particular, compared to lasers, LEDs are temporally and spatially incoherent, so that speckle effects can be avoided by the application of LEDs. Besides, LED arrays are qualified due to their high optical output power. However, LED arrays have not been widely used for investigating optical effects, e.g., the Lau effect. In this paper, we propose the application of an LED array for realizing the Lau effect by taking into account the influence of the coherence properties of illumination on the Lau effect. Using spatially incoherent illumination with the LED array or a single LED, triangular distributed Lau fringes can be obtained. We apply the obtained Lau fringes in the optical lithography to produce analog structures. Compared to a single LED, the Lau fringes using the LED array have significantly higher intensities. Hence, the exposure time in the lithography process is largely reduced.

Metaform optics: Bridging nanophotonics and freeform optics

The demand for high-resolution optical systems with a compact form factor, such as augmented reality displays, sensors, and mobile cameras, requires creating new optical component architectures. Advances in the design and fabrication of freeform optics and metasurfaces make them potential solutions to address the previous needs. Here, we introduce the concept of a metaform—an optical surface that integrates the combined benefits of a freeform optic and a metasurface into a single optical component. We experimentally realized a miniature imager using a metaform mirror. The mirror is fabricated via an enhanced electron beam lithography process on a freeform substrate. The design degrees of freedom enabled by a metaform will support a new generation of optical systems.

Guiding Chart for Initial Layer Choice with Nanoimprint Lithography

When nanoimprint serves as a lithography process, it is most attractive for the ability to overcome the typical residual layer remaining without the need for etching. Then, ‘partial cavity filling’ is an efficient strategy to provide a negligible residual layer. However, this strategy requires an adequate choice of the initial layer thickness to work without defects. To promote the application of this strategy we provide a ‘guiding chart’ for initial layer choice. Due to volume conservation of the imprint polymer this guiding chart has to consider the geometric parameters of the stamp, where the polymer fills the cavities only up to a certain height, building a meniscus at its top. Furthermore, defects that may develop during the imprint due to some instability of the polymer within the cavity have to be avoided; with nanoimprint, the main instabilities are caused by van der Waals forces, temperature gradients, and electrostatic fields. Moreover, practical aspects such as a minimum polymer height required for a subsequent etching of the substrate come into play. With periodic stamp structures the guiding chart provided will indicate a window for defect-free processing considering all these limitations. As some of the relevant factors are system-specific, the user has to construct his own guiding chart in praxis, tailor-made to his particular imprint situation. To facilitate this task, all theoretical results required are presented in a graphical form, so that the quantities required can simply be read from these graphs. By means of examples, the implications of the guiding chart with respect to the choice of the initial layer are discussed with typical imprint scenarios, nanoimprint at room temperature, at elevated temperature, and under electrostatic forces. With periodic structures, the guiding chart represents a powerful and straightforward tool to avoid defects in praxis, without in-depth knowledge of the underlying physics.