Intrinsic roughness and interfaces of Cr/Be multilayers

The structures of Cr/Be multilayer mirror interfaces are investigated using X-ray reflectometry, diffuse X-ray scattering and atomic force microscopy. The combination of these methods makes it possible to separate the contributions of roughness and interlayer diffusion/intermixing for each sample. In the range of period thicknesses of 2.26–0.8 nm, it is found that the growth roughness of the Cr/Be multilayer mirrors does not depend on the period thickness and is ∼0.2 nm. The separation of roughness and diffuseness allows estimation of layer material intermixing and the resulting drop in the optical contrast, which is from 0.85 to 0.17 in comparison with an ideally sharp structure.

Thermal optimization of a high-heat-load double-multilayer monochromator

Finite-element analysis is used to study the thermal deformation of a multilayer mirror due to the heat load from the undulator beam at a low-emittance synchrotron source, specifically the ESRF-EBS upgrade beamline EBSL-2. The energy bandwidth of the double-multilayer monochromator is larger than that of the relevant undulator harmonic, such that a considerable portion of the heat load is reflected. Consequently, the absorbed power is non-uniformly distributed on the surface. The geometry of the multilayer substrate is optimized to minimize thermally induced slope errors. We distinguish between thermal bending with constant curvature that leads to astigmatic focusing or defocusing and residual slope errors. For the EBSL-2 system with grazing angles θ between 0.2 and 0.4°, meridional and sagittal focal lengths down to 100 m and 2000 m, respectively, are found. Whereas the thermal bending can be tuned by varying the depth of the `smart cut', it is found that the geometry has little effect on the residual slope errors. In both planes they are 0.1–0.25 µrad. In the sagittal direction, however, the effect on the beam is drastically reduced by the `foregiveness factor', sin(θ). Optimization without considering the reflected heat load yields an incorrect depth of the `smart cut'. The resulting meridional curvature in turn leads to parasitic focal lengths of the order of 100 m.

Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors

The extreme ultraviolet (EUV) phase retarder is an important optical element for polarization analysis and conversion of EUV synchrotron radiation. In this paper, a linearly chirped Mo/Si multilayer mirror is used to design an EUV phase retarder. With increasing thickness variation of the chirped multilayer, the reflective phase retardation between s- and p-polarized light increases at first and then reaches its maximum value. When the bilayer number increases from 2 to 20, the maximum phase retardation for an EUV source with a photon energy of 90 eV increases from 5.97° to 245.10° for a linearly chirped Mo/Si multilayer with 14.7 nm central thickness. In addition, the phase retardations of chirped mirrors at different photon energies (80 eV, 85 eV and 90 eV) are also investigated and compared. Furthermore, the physical mechanism of reflective phase retardation improvement is also studied by investigating the field intensity distributions inside chirped mirrors.

Improvement of the Microstructure and X-ray Performance of Ultrathin Ru/C Multilayer Mirror after High Temperature Treatment

Ru/C multilayer mirrors with a period of 2.5 nm and 150 bilayers were studied under high-temperature annealing and long-term storage. A general increase in the reflectivity was observed after annealing at different temperatures from 300 to 700 °C, during which a maximum enhancement of around 14% was obtained at 600 °C. The highest reflectance measured at 8 keV reached 69% after 600 °C annealing. This was accompanied by a 6% expansion of the layer period, which could be mainly attributed to carbon layers. The surface roughness was not affected by the annealing, whereas the polycrystallization of Ru with crystallographic planes parallel to the layer interfaces was enhanced. Combining the transmission-electron microscopy measurements, it was found that the interdiffusion at the C-on-Ru interface was significantly suppressed. The decreased interdiffusion, enhanced optical contrast, and larger multilayer period were the main reasons for the increased reflectance. The 600 °C annealed Ru/C multilayer remained intact after 13 months of storage in air, which also demonstrated significant temporal stability.