low temperature photoluminescence
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2021 ◽  
pp. 118556
Author(s):  
A.A. Razgulov ◽  
S.G. Lyapin ◽  
A.P. Novikov ◽  
E.A. Ekimov

2021 ◽  
pp. 108379
Author(s):  
A.A. Razgulov ◽  
S.G. Lyapin ◽  
A.P. Novikov ◽  
E.A. Ekimov

2020 ◽  
Author(s):  
Xiejia

The short research of optimization of the growth method to obtain p-type GaAs (001) layers using Si as the dopant was reported in this work. Atomic force microscopy was used to analyze the surface morphology and low-temperature photoluminescence also used to confirm the p-type of the layers.


2020 ◽  
Vol 212 (1) ◽  
pp. 147-155
Author(s):  
Y. J. Zhai ◽  
X. L. Chen ◽  
J. H. Li ◽  
X. Y. Chu ◽  
Y. Zhang

2020 ◽  
Author(s):  
Dong Fong

The short research of optimization of the growth method to obtain p-type GaAs (001) layers using Si as the dopant was reported in this work. Atomic force microscopy was used to analyze the surface morphology and low-temperature photoluminescence also used to confirm the p-type of the layers.


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