Fabrication of La2-x Ce x CuO4 Thin Films using Pulsed Laser Ablation Method

2000 ◽  
pp. 912-914 ◽  
Author(s):  
Yasuhiro Matsuo ◽  
Kiyosi Betsuyaku ◽  
Hirosi Katayama-Yoshida ◽  
Tomoji Kawai
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Laser Ablation Method

Investigation of the Characteristics of Ferroelectric Thin Films Deposited by Pulsed Laser Ablation

1994 ◽  
Vol 361 ◽  
Author(s):  
S. Sengupta ◽  
D.P. Vijay ◽  
S.B. Desu
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Secondary Phase ◽  
Ferroelectric Thin Films ◽  
Laser Ablation Method ◽  
Target Composition ◽  
Lower Oxygen

ABSTRACTFerroelectric thin films of barium strontium titanate (BSTO) have been deposited on bare and metallized substrates by pulsed laser ablation method under different oxygen ambients (150 mT and 50 mT). Under an oxygen pressure of 150 mT, the film composition was similar to that of its ablation target composition, viz. Ba0.4TiO3. However, when the films were deposited under the lower oxygen pressure, x-ray diffraction studies showed the presence of a secondary phase. The electrical characteristics of the films were measured to examine the effect of the stoichiometry on the dielectric constant and tunability. The results of this study will be presented.

scholarly journals Orientation dependent ferroelectric properties in samarium doped bismuth titanate thin films grown by the pulsed-laser-ablation method

2006 ◽  
Vol 89 (3) ◽  
pp. 032901 ◽  
Author(s):  
Zhenxiang Cheng ◽  
Chinna Venkatasamy Kannan ◽  
Kiyoshi Ozawa ◽  
Hideo Kimura ◽  
Xiaolin Wang
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Bismuth Titanate ◽  
Ferroelectric Properties ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Laser Ablation Method

Evaluation of Planar-Type Thin Film ZnO Varistors Fabricated Using Pulsed Laser Ablation

2006 ◽  
Vol 320 ◽  
pp. 109-112
Author(s):  
Sayuki Sawa ◽  
Shinzo Yoshikado
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Alumina Substrate ◽  
Laser Ablation Method ◽  
Zno Varistors ◽  
532 Nm ◽  
Deposited Films

Planar-type thin film Bi-Mn-Co-doped ZnO varistors were fabricated on a silica glass substrate or a sintered alumina substrate using a visible light (532 nm) pulsed laser ablation method. The deposited thin films were annealed at 800°C or 900°C in air. For the thin films deposited on alumina substrates and then annealed, the contents of Bi and Mn decreased compared with those of the as-deposited films. Voltage-current (V-I) characteristics of the thin-film varistor fabricated on the alumina substrates and annealed showed nonlinearity. The nonlinearity index α was approximately 10 for the thin film deposited on the alumina substrate and annealed at 800°C in air using a target of ZnO doped with 2.5 mol% Bi2O3, 0.5 mol% MnO2 and 0.2 mol% Co3O4. Moreover, the current density of 20 A/cm3 was relatively high for safety use.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

ZnS thin films grown on Si(100) by XeCl pulsed laser ablation

2001 ◽  
Vol 177 (1-2) ◽  
pp. 73-77 ◽  
Author(s):  
K.T Hillie ◽  
C Curren ◽  
H.C Swart
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation
Sign in / Sign up

Export Citation Format

Share Document