Conceptual design of pulsed high voltage and high precision power supply for a cyclotron auto-resonance maser (CARM) for plasma heating

2015 ◽  
Vol 98-99 ◽  
pp. 1197-1201 ◽  
Author(s):  
Pietro Zito ◽  
Giuseppe Maffia ◽  
Alessandro Lampasi
Keyword(s):  
Conceptual Design ◽  
High Precision ◽  
High Voltage ◽  
Power Supply ◽  
Plasma Heating

130 kV 130 A High voltage switching mode power supply for neutral beam plasma heating: design issues

2003 ◽  
Vol 66-68 ◽  
pp. 615-620 ◽  
Author(s):  
D. Ganuza ◽  
J.M. Del Rı́o ◽  
I. Garcı́a ◽  
F. Garcı́a ◽  
P. Garcı́a de Madinabeitia ◽  
...  
Keyword(s):  
High Voltage ◽  
Power Supply ◽  
Plasma Heating ◽  
Neutral Beam ◽  
Design Issues ◽  
Beam Plasma ◽  
Switching Mode Power Supply ◽  
Switching Mode ◽  
Voltage Switching

Low-Ripple and High-Precision High-Voltage DC Power Supply for Pulsed Power Applications

2014 ◽  
Vol 42 (10) ◽  
pp. 3023-3033 ◽  
Author(s):  
Suk-Ho Ahn ◽  
Hong-Je Ryoo ◽  
Ji-Woong Gong ◽  
Sung-Roc Jang
Keyword(s):  
High Precision ◽  
High Voltage ◽  
Power Supply ◽  
Pulsed Power ◽  
Dc Power ◽  
Dc Power Supply

Development of a Self-Feedback Adjustment Piezoelectric Ceramic Power Supply

2007 ◽  
Vol 10-12 ◽  
pp. 538-542
Author(s):  
L. Zhou ◽  
Qiang Liu ◽  
Ying Xue Yao
Keyword(s):  
High Precision ◽  
High Voltage ◽  
Power Supply ◽  
Piezoelectric Ceramic ◽  
Quick Response ◽  
Supply Circuit ◽  
Voltage Supply ◽  
In Series ◽  
High Voltage Supply ◽  
Driving Capability

A piezoelectric ceramic power supply with self-feedback adjustment was developed according to piezoelectric ceramic driver’s characteristic. It uses multi dc voltages connected in series as the high voltage supply circuit, and has many advantages, such as small ripple, high precision, high driving capability, quick response and so on.

Study on Selective Leakage Protection System of Mine High Voltage Grid Based on Harmonic Phase Comparison

2015 ◽  
Vol 9 (1) ◽  
pp. 253-262
Author(s):  
Liu Zhongfu ◽  
Zhang Junxing ◽  
Shi Lixin ◽  
Yang Yaning
Keyword(s):  
High Voltage ◽  
Power Supply ◽  
Power Supply System ◽  
Supply System ◽  
Neutral Point ◽  
Arc Suppression Coil ◽  
Zero Sequence ◽  
Harmonic Extraction ◽  
Power Direction ◽  
The Stability

As for the wide application of arc suppression coil to the grounding in neutral point of mine high voltage grid, grid leakage fault rules and harmonic characteristics of the neutral point grounding system through arc suppression coil are analyzed, the selective leakage protection program “zero-sequence voltage starts, fifth harmonics of grid zerosequence voltage and zero-sequence current are extracted for phase comparison” is proposed, and corresponding fifth harmonic extraction circuit and power direction discrimination circuit are designed. The experimental results show that the protective principle applies not only to the neutral point insulated power supply system, but also to the power supply system in which neutral point passes arc suppression coil, which can solve selective leakage protection problems under different neutral grounding ways, improving the reliability of selective leakage and guaranteeing the stability of the action value.

scholarly journals High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1228
Author(s):  
Marcin Winnicki ◽  
Artur Wiatrowski ◽  
Michał Mazur
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
High Voltage ◽  
High Power ◽  
Power Supply ◽  
Indium Tin Oxide ◽  
Volume Ratio ◽  
Cold Spraying ◽  
High Voltage Power Supply ◽  
Composite Target

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

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