Laser-induced fluorescence probing during pulsed-laser ablation for three-dimensional number density mapping of plasma species

2001 ◽  
Vol 34 (23) ◽  
pp. 3356-3363 ◽  
Author(s):  
Christophe Dutouquet ◽  
Jörg Hermann
2002 ◽  
Vol 17 (3) ◽  
pp. 697-700 ◽  
Author(s):  
D. B. Jan ◽  
Q. X. Jia ◽  
M. E. Hawley ◽  
G. W. Browne ◽  
C. J. Wetteland ◽  
...  

The formation of superconducting YBa2Cu3O7–x (Y123) by in situ pulsed laser deposition from a stoichiometric Y123 target typically requires an oxygen-ambient environment (P ˜ 100–300-mtorr O2) and appropriate substrate temperature during deposition. We have found that pulsed laser deposition from a Y123 target in vacuo onto a (001) LaAlO3 substrate favors the formation of Y2O3. We observed that the Y2O3 (001) films yield three-dimensional nanoscale morphologies that are markedly different from the planar growth surface of conventional superconducting c-axis Y123 films and Y2O3 films formed from the pulsed laser ablation of a Y2O3 target.


1995 ◽  
Vol 388 ◽  
Author(s):  
D. G. Goodwin ◽  
D. L. Capewell ◽  
P. H. Paul

AbstractPlanar laser-induced fluorescence has been used to acquire time sequence images of ground-state, neutral Si and SiO during laser ablation of an Si target in vacuum and in the presence of a background gas at a fluence of 3-4 J/cm2. the SiO images, taken in air, strongly suggest that the observed SiO is created through reaction of silicon with oxygen at the contact front as the plume expands.


2013 ◽  
Vol 717 ◽  
pp. 177-183
Author(s):  
L. D’Alessio ◽  
G. Pace ◽  
R. Teghil

In this work the microscopic morphology of titanium carbide thin films, obtained by pulsed laser ablation, are studied. A target of TiC has been ablated in vacuum with a laser Twinkle of Light Conversion Ltd. capable to furnish impulses of 250 fs, with a repetition frequency of 10 Hz at the wavelength of 527 nm. The ablated material has been deposited on (111) oriented silicon substrates, maintained at ambient temperature during the film deposition. Digital images of the films have been acquired through scanning electron microscopy. Numerical codes have been developed in Matlab environment, to obtain a three-dimensional reconstruction of the film surfaces starting from the bidimensional images. On such reconstruction a multi-scale analysis has been performed by hilbertian methods, for the characterization of the surface roughness and to study the distribution of the deposited nanoparticles. The results show that the free surface of the film has a characteristics scale invariance that allow the description by multi-fractal techniques. In particular the fractal dimension of the surface has been calculated in nanometric range. The investigation allows to identify some proper morphological indicators to characterize the film geometry and parameterize the tribological properties of the interface. These indicators, if opportunely employed together with classical methods of analysis, furnish a further tool for better understanding the complex nature of the deposits.


Author(s):  
M. Grant Norton ◽  
C. Barry Carter

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.


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