Influence of post-annealing on the mechanical and electrical properties of boron-doped nanocrystalline silicon thin films

2009 ◽  
Author(s):  
J.N. Ding ◽  
H.S. Qi ◽  
N.Y. Yuan ◽  
Y.L. He ◽  
G.G. Cheng
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Nanocrystalline Silicon ◽  
Silicon Thin Films ◽  
Mechanical And Electrical Properties ◽  
Boron Doped ◽  
Post Annealing

Highly conductive boron doped micro/nanocrystalline silicon thin films deposited by VHF-PECVD for solar cell applications

2015 ◽  
Vol 643 ◽  
pp. 94-99 ◽  
Author(s):  
Sucheta Juneja ◽  
S. Sudhakar ◽  
Jhuma Gope ◽  
Kalpana Lodhi ◽  
Mansi Sharma ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Nanocrystalline Silicon ◽  
Silicon Thin Films ◽  
Boron Doped

Boron-Doped Nanocrystalline Silicon Thin Films Prepared by PECVD

2012 ◽  
Vol 503 ◽  
pp. 386-390
Author(s):  
Xiu Qin Wang ◽  
Jian Ning Ding ◽  
Ning Yi Yuan ◽  
Shu Bo Wang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Substrate Temperature ◽  
Volume Fraction ◽  
Chemical Vapour ◽  
Nanocrystalline Silicon ◽  
Process Conditions ◽  
Rf Power ◽  
Silicon Thin Films ◽  
Boron Doped

Boron-doped nanocrystalline silicon thin films(p-nc-Si:H) were deposited on glass substrates by plasma enhanced chemical vapour deposition (PECVD) using SiH4/ H2/ B2H6. The effects of substrate temperature, rf power and diborane flow on the microstructure, the electrical properties of nanocrystalline silicon thin films have been investigated. The results show that, increasing substrate temperature, rf power and B2H6flow can improve the conductivity of P-Si thin film. However, exceeding one value, they are not advantageous to improve the conductivity due to the decrystallization of films. Hence, appropriate process conditions are crucial for the preparation of high quality p layer. crystalline volume fraction (Xc) 26.2 %, mean grain size (d) 3.5nm and conductivity 0.374S/cm, p-nc-Si:H thin film was deposited.

scholarly journals Boron-doped nanocrystalline silicon thin films for solar cells

2011 ◽  
Vol 257 (21) ◽  
pp. 8901-8905 ◽  
Author(s):  
E. Fathi ◽  
Y. Vygranenko ◽  
M. Vieira ◽  
A. Sazonov
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Nanocrystalline Silicon ◽  
Silicon Thin Films ◽  
Boron Doped
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