A high performance double-gate SOI MOSFET using lateral solid phase epitaxy

Author(s):  
Haitao Liu ◽  
Zhibin Xiong ◽  
Sin ◽  
Peiqi Xuan ◽  
Bokor
2003 ◽  
Vol 50 (6) ◽  
pp. 1552-1555 ◽  
Author(s):  
Haitao Liu ◽  
Zhibin Xiong ◽  
J.K.O. Sin

2018 ◽  
Vol 7 (2.8) ◽  
pp. 191
Author(s):  
Arjimand Ashaf ◽  
Manisha Tyagi ◽  
Prashant Mani

In this paper, we are presenting a rigorous study about SOI MOSFET devices development. The development of SOI devices based on gate structure from single gate to surround gate is presented in this paper. We compared the various electrical characteristics between Single gate, double gate, and bulk and also discussed the device modeling based on surround gate structure.


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