High Speed Beam Deflection and Blanking for Electron Lithography

1973 ◽  
Vol 10 (6) ◽  
pp. 987-990 ◽  
Author(s):  
L. H. Lin ◽  
H. L. Beauchamp
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Florian Roessler ◽  
André Streek

Abstract In laser processing, the possible throughput is directly scaling with the available average laser power. To avoid unwanted thermal damage due to high pulse energy or heat accumulation during MHz-repetition rates, energy distribution over the workpiece is required. Polygon mirror scanners enable high deflection speeds and thus, a proper energy distribution within a short processing time. The requirements of laser micro processing with up to 10 kW average laser powers and high scan speeds up to 1000 m/s result in a 30 mm aperture two-dimensional polygon mirror scanner with a patented low-distortion mirror configuration. In combination with a field programmable gate array-based real-time logic, position-true high-accuracy laser switching is enabled for 2D, 2.5D, or 3D laser processing capable to drill holes in multi-pass ablation or engraving. A special developed real-time shifter module within the high-speed logic allows, in combination with external axis, the material processing on the fly and hence, processing of workpieces much larger than the scan field.


2013 ◽  
Vol 710 ◽  
pp. 269-272
Author(s):  
Guo Ya Xu ◽  
Jun Hua He ◽  
Fan Sen ◽  
Yuan Tao Zhu

Design an all-optical solid-state scanner chip, which can realize high speed light deflection in a very small space, instead of electron beam deflection scan image converter tube and opto-mechanical scanner, cancel the complicated mechanical components, use the all-optical scanning to realize the super fast phenomenon observation. The beam deflection system is based on semiconductor optical waveguide core layer carrier induced refractive index change effect to realize, its development work is mainly divided into semiconductor optical waveguide and saw prisms two parts. And through the experiment, we measured deflection angle of the scanner chip to 1053nm signal light.


1996 ◽  
Vol 96-98 ◽  
pp. 154-158 ◽  
Author(s):  
J. Diaci ◽  
D. Hurley ◽  
J.W. Wagner ◽  
J. Mozˇina

1975 ◽  
Vol 10 (2) ◽  
pp. 92-96 ◽  
Author(s):  
R.C. Henderson ◽  
R.F. Pease ◽  
A.M. Voshchenkov ◽  
R.F. Helm ◽  
R.L. Wadsack

2004 ◽  
Author(s):  
Junji Hirumi ◽  
Nobuyuki Yoshioka ◽  
Hiromichi Hoshi ◽  
Hiroyoshi Ando ◽  
Seiichi Tsuchiya ◽  
...  

1986 ◽  
Vol 4 (1) ◽  
pp. 84-90
Author(s):  
Taizo Iwami ◽  
Hidenobu Murakami ◽  
Seiji Yasunaga

Author(s):  
R.C. Henderson ◽  
R.F.W. Pease ◽  
A.M. Voshchenkov ◽  
P. Mallery ◽  
R.L. Wadsack

2007 ◽  
Vol 19 (9) ◽  
pp. 701-703 ◽  
Author(s):  
Alexei L. Glebov ◽  
Akio Sugama ◽  
Vadim I. Smirnov ◽  
Shigenori Aoki ◽  
Vasile Rotar ◽  
...  

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