Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50 nm resolution capability

2006 ◽  
Author(s):  
Kyoko Kojima ◽  
Takashi Hattori ◽  
Hiroshi Fukuda ◽  
Taku Hirayama ◽  
Daiju Shiono ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Resolution Capability ◽  
Negative Tone ◽  
Polarity Change

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

scholarly journals The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography.

1994 ◽  
Vol 7 (3) ◽  
pp. 619-630 ◽  
Author(s):  
James W. Thackeray ◽  
Timothy Adams ◽  
Michael F. Cronin ◽  
Mark Denison ◽  
Theodore H. Fedynyshyn ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Negative Tone

Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

2014 ◽  
Vol 25 (31) ◽  
pp. 315301 ◽  
Author(s):  
Prashant K Kulshreshtha ◽  
Ken Maruyama ◽  
Sara Kiani ◽  
James Blackwell ◽  
Deirdre L Olynick ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Naoko Ito ◽  
Daisuke Inokuchi ◽  
Yasushi Nishiyama ◽  
Yuichi Fukushima ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

1997 ◽  
Vol 9 (8) ◽  
pp. 1725-1730 ◽  
Author(s):  
Qinghuang Lin ◽  
Thomas Steinhäusler ◽  
Logan Simpson ◽  
Michelle Wilder ◽  
David R. Medeiros ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Negative Tone
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