ANALYSIS OF AN INVERSE PROBLEM ARISING IN PHOTOLITHOGRAPHY
2012 ◽
Vol 22
(05)
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pp. 1150026
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Keyword(s):
We consider the inverse problem of determining an optical mask that produces a desired circuit pattern in photolithography. We set the problem as a shape design problem in which the unknown is a two-dimensional domain. The relationship between the target shape and the unknown is modeled through diffractive optics. We develop a variational formulation that is well-posed and propose an approximation that can be shown to have convergence properties. The approximate problem can serve as a foundation to numerical methods, much like the Ambrosio–Tortorelli's approximation of the Mumford–Shah functional in image processing.
2001 ◽
Vol 5
(2)
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pp. 87-104
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Keyword(s):
2002 ◽
Vol 459
◽
pp. 93-102
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2019 ◽
Vol 59
(5)
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pp. 859-859
Keyword(s):
2007 ◽
Vol 43
(9)
◽
pp. 1200-1212
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Keyword(s):
1990 ◽
Vol 05
(16)
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pp. 1251-1258
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Keyword(s):
Keyword(s):